H05H1/466

DEVICE FOR PLASMA TREATMENT OF ELECTRONIC MATERIALS

Plasma applications are disclosed that operate with argon and other molecular gases at atmospheric pressure, and at low temperatures, and with high concentrations of reactive species. The plasma apparatus and the enclosure that contains the plasma apparatus and the substrate are substantially free of particles, so that the substrate does not become contaminated with particles during processing. The plasma is developed through capacitive discharge without streamers or micro-arcs. The techniques can be employed to remove organic materials from a substrate, thereby cleaning the substrate; to activate the surfaces of materials, thereby enhancing bonding between the material and a second material; to etch thin films of materials from a substrate; and to deposit thin films and coatings onto a substrate; all of which processes are carried out without contaminating the surface of the substrate with substantial numbers of particles.

METHODS AND APPARATUS FOR REDIRECTING IONS GENERATED FROM ATMOSPHERIC PRESSURE LOW TEMPERATURE PLASMA

Some embodiments are directed to a generator and separator assembly for generating ions via atmospheric pressure, low temperature plasma and separating the generated ions. The generator and separator assembly include a plasma generator for generating the generating atmospheric pressure, low temperature plasma that is configured to eject positively and negatively ions. A separator is disposed to receive the positively and negatively ions ejected from the plasma generator, and includes a first separator electrode; a second separator electrode spaced from the first separator electrode; and a separator power supply that supplies electric power in the form of at least one of different voltages and different polarities to the first and second electrodes ranging from 0 kV and 10 kV, such that the received positively charged ions are redirected in one direction and the received negatively charged ions are redirected to another direction different from the one direction.

SYSTEMS AND METHODS FOR TATTOO REMOVAL USING COLD PLASMA

A method and system for tattoo removal from a subject by exposing tattoo ink particles trapped within the dermis to a cold plasma is described herein. The tattoo removal method and system can be used to remove the tattoo from the skin of the subject being treated. In addition, the method and system described allows for the extraction of the tattoo ink particles, which may have toxic properties, from the subject's body.

Matchless plasma source for semiconductor wafer fabrication

A matchless plasma source is described. The matchless plasma source includes a controller that is coupled to a direct current (DC) voltage source of an agile DC rail to control a shape of an amplified square waveform that is generated at an output of a half-bridge transistor circuit. The matchless plasma source further includes the half-bridge transistor circuit used to generate the amplified square waveform to power an electrode, such as an antenna, of a plasma chamber. The matchless plasma source also includes a reactive circuit between the half-bridge transistor circuit and the electrode. The reactive circuit has a high-quality factor to negate a reactance of the electrode. There is no radio frequency (RF) match and an RF cable that couples the matchless plasma source to the electrode.

PLASMA GENERATOR

A plasma generator includes a cathode, an anode, and a stabilizing electrode. The stabilizing electrode stabilises a region of plasma within a fluid. Methods of plasma generation and uses thereof are also provided.

Pulsed non-thermal atmospheric pressure plasma processing system

A system for generating and delivering a low temperature, wide, partially ionized tunable plasma stream is described. The system employs a fast rising, repetitive high voltage pulse generator, flowing gas, and a plasma head to produce the described atmospheric pressure plasma stream and its associated active species. The plasma head may have an exit slit with a relatively wide dimension to produce a relative wide plasma stream. Electrodes may be located proximate the exit slit, for example one in an interior of the plasma head via with gas flows toward the exit slit, and the other exterior to the plasma head and offset from the exit slit. The plasma may include baffle material to enhance a uniformity of flow through and across the exit slit. Plasma heads with having exit slit with different widths may be provided as a kit.

Rotary plasma reactor

A rotary plasma reactor system is provided. In another aspect, a plasma reactor is rotatable about a generally horizontal axis within a vacuum chamber. A further aspect employs a plasma reactor, a vacuum chamber, and an elongated electrode internally extending within a central area of the reactor. Yet another aspect employs a plasma reactor for use in activating, etching and/or coating tumbling workpiece material.

INDUCTION FEED THROUGH SYSTEM
20220418077 · 2022-12-29 ·

An induction feed through system for treating a flow of material is disclosed, including a high voltage energy source energizing a low-turn coil wrapped about an outer wall of a reaction chamber. The flow of electricity through the low-turn coil in turn energizes a high-turn coil wrapped about an inner wall disposed within the outer wall of the reaction chamber. An electrode assembly disposed within the reaction chamber is electrically coupled to and energized by the high-turn coil, in turn generating plasma in the reaction chamber. The plasma is used to excite a flow of material through the induction feed through system. The electromagnetic properties of the plasma further provide direct feedback to the low-turn and high-turn coils.

Plasma gun for treating tumors in vivo and use method thereof

A plasma gun for treating a tumor in vivo and a use method thereof. The plasma gun includes a generator component including an ionization device and a shield element, and a discharge component. The ionization device is provided at the shield element, and the discharge component is connected to an end of the shield element. The present invention overcomes the problem that a low-temperature plasma jet cannot contact a tumor in vivo. The plasma gun reaches the interior of the tumor, promoting the treatment of the plasma to the tumors. It is suitable for the application in clinical treatment. As compared with the conventional radiotherapy, chemotherapy and surgery, the present invention has the advantages of selectivity on cancer cells and little side effects. The plasma directly reaches the tumor lesion, which has good therapeutic effect and avoids the impact on normal tissues.

Low temperature atmospheric pressure plasma for cleaning and activating metals

Plasma applications are disclosed that operate with argon or helium at atmospheric pressure, and at low temperatures, and with high concentrations of reactive species in the effluent stream. Laminar gas flow is developed prior to forming the plasma and at least one of the electrodes can be heated which enables operation at conditions where the argon or helium plasma would otherwise be unstable and either extinguish, or transition into an arc. The techniques can be employed to clean and activate a metal substrate, including removal of oxidation, thereby enhancing the bonding of at least one other material to the metal.