Embodiments of systems, devices, and methods relating to a beam system. An example beam system includes a charged particle source configured to generate a beam of charged particles, a pre-accelerator system configured to accelerate the beam, and an accelerator configured to accelerate the beam from the pre-accelerator system. The pre-accelerator system can cause the beam to converge as it is propagated from the source to an input aperture of the accelerator. The pre-accelerator system can further reduce or eliminate source disturbance or damage caused by backflow traveling from the accelerator toward the source.

Embodiments of systems, devices, and methods relating to a beam system. An example beam system includes a charged particle source configured to generate a beam of charged particles, a pre-accelerator system configured to accelerate the beam, and an accelerator configured to accelerate the beam from the pre-accelerator system. The pre-accelerator system can cause the beam to converge as it is propagated from the source to an input aperture of the accelerator. The pre-accelerator system can further reduce or eliminate source disturbance or damage caused by backflow traveling from the accelerator toward the source.

An over-voltage protection system for an accelerator can include: a plurality of DC power supplies configured to provide a plurality of voltage levels up to a desired voltage level; and an acceleration tube electrically connected to the plurality of DC power supplies and configured to accelerate a charged particle. The acceleration tube can include a plurality of stages. Each stage can include a plurality of electrodes and a plurality of varistors configured to discharge energy in response to an overvoltage event. One electrode of the plurality of electrodes can be electrically coupled to a voltage level of the plurality of voltage levels. The plurality of electrodes and the plurality of varistors can be electrically coupled to each other and arranged in an alternating fashion.

A high-voltage electrostatic generator has an assembly of concentric electrically conductive half-shells separated by an equatorial gap, essentially with cylindrical symmetry about an axis. Adjacent to the equatorial gap, edge regions of at least a selected subset of the half-shells are shaped.

A fusible target is embedded in a high Z liner, ohmically heated and then shock wave heated by implosion of an enveloping high Z liner. The target is adiabatically heated by compression, fusibly ignited and charged-particle heated as it is being ignited. A shock front forms as the liner implodes which shock front detaches from the more slowly moving liner, collides with the outer surface of the target, accelerates inward, rapidly heating the target, adiabatically compressing the target and liner and amplifying the current to converge the liner mass toward a central axis thereby compressing the target to a fusion condition when it begins to ignite and produce charged particles. The charged particles are trapped in a large magnetic field surrounding the target. The energy of the charged particles is deposited into the target to further heat the target to produce an energy gain.

An electrode for manipulating an ion beam. The electrode may include an insert having an ion beam aperture to conduct the ion beam therethrough, the insert comprising a first electrically conductive material; a frame disposed around the insert and comprising a second electrically conductive material; and an outer portion, the outer portion disposed around the frame and comprising a third electrically conductive material, wherein the insert is reversibly detachable from the frame, and wherein the frame is reversibly attachable from the outer portion.

A compact particle accelerator having an input portion configured to receive power to produce particles for acceleration, where the input portion includes a switch, is provided. In a general embodiment, a vacuum tube receives particles produced from the input portion at a first end, and a plurality of wafer stacks are positioned serially along the vacuum tube. Each of the plurality of wafer stacks include a dielectric and metal-oxide pair, wherein each of the plurality of wafer stacks further accelerate the particles in the vacuum tube. A beam shaper coupled to a second end of the vacuum tube shapes the particles accelerated by the plurality of wafer stacks into a beam and an output portion outputs the beam.

A compact particle accelerator having an input portion configured to receive power to produce particles for acceleration, where the input portion includes a switch, is provided. In a general embodiment, a vacuum tube receives particles produced from the input portion at a first end, and a plurality of wafer stacks are positioned serially along the vacuum tube. Each of the plurality of wafer stacks include a dielectric and metal-oxide pair, wherein each of the plurality of wafer stacks further accelerate the particles in the vacuum tube. A beam shaper coupled to a second end of the vacuum tube shapes the particles accelerated by the plurality of wafer stacks into a beam and an output portion outputs the beam.

Embodiments of systems, devices, and methods relate to a beam system. An example beam system includes a charged particle source configured to generate a beam of charged particles, a pre-accelerator system configured to accelerate the beam, and an accelerator configured to accelerate the beam from the pre-accelerator system. The pre-accelerator system can cause the beam to converge as it is propagated from the source to an input aperture of the accelerator. The pre-accelerator system can further reduce or eliminate source disturbance or damage caused by backflow traveling from the accelerator toward the source.

Embodiments of systems, devices, and methods relate to a beam system. An example beam system includes a charged particle source configured to generate a beam of charged particles, a pre-accelerator system configured to accelerate the beam, and an accelerator configured to accelerate the beam from the pre-accelerator system. The pre-accelerator system can cause the beam to converge as it is propagated from the source to an input aperture of the accelerator. The pre-accelerator system can further reduce or eliminate source disturbance or damage caused by backflow traveling from the accelerator toward the source.