The present disclosure relates to semiconductor structures and, more particularly, to a device triggered silicon control rectifiers (SCR) and methods of manufacture. The structure includes: a first device comprising a first shallow diffusion region of a first conductivity type within a first well of a second conductivity type and a second shallow diffusion region of the first conductivity type within the first well of the second conductivity type.

A two terminal semiconductor controlled rectifier (SCR) device has an anode terminal coupled to a first node and a cathode terminal coupled to a second node. Neither of the cathode gate or anode gate of the SCR device are connected to a triggering circuit for controlling turn on of the SCR device. The SCR device has an avalanche breakdown voltage for turn on, where that avalanche breakdown voltage is set by a breakdown avalanche of a PN junction of the SCR device. A circuit path includes a series connected chain of M Zener diodes with a blocking diode that are coupled between the first node and the second node. The circuit path has an activation voltage for turn on, where that activation voltage is dependent on N times a Zener diode reverse breakdown voltage. The activation voltage is less than the avalanche breakdown voltage.

The present disclosure is directed to an input/output (I/O) interface that includes a set of complementary metal-oxide semiconductor (CMOS) transistors in a P-type substrate. A first N-type region is in the substrate and a second N-type region in the substrate spaced from the first N-type region, the second N-type region being a deep-NWELL (DNW). A first heavily doped P-type region is between the first and second N-type regions, the first heavily doped P-type region is coupled to ground. A second heavily doped P-type region in the first N-type region, the second heavily doped P-type region and is coupled to an output terminal. A first heavily doped N-type region is in the first N-type region, the first heavily doped N-type region is coupled to a floating-Well (FW) terminal. A second heavily is doped N-type region in the second N-type region. A resistor is coupled to the DNW and the resistor is coupled to a voltage supply terminal.

Capacitor cells are provided. A first PMOS transistor is coupled between a power supply and a first node, and has a gate directly connected to a second node. A first NMOS transistor is coupled between a ground and the second node, and has a gate directly connected to the first node. A second PMOS transistor is coupled between the second node and the power supply, and has a gate directly connected to the second node. A second NMOS transistor is coupled between the first node and the ground, and has a gate directly connected to the first node. Sources of the first and second NMOS transistors share an N+ doped region in the P-type well region. The first NMOS transistor is disposed between the second NMOS transistor and the first and second PMOS transistors. Source of the first PMOS transistor is directly connected to the power supply.

A two-terminal IC device may be used for ESD protection. The IC device may include a deep N-well may be between a P-type substrate and a group of wells that includes a first P-well, a second P-well, and a N-well. There may be another well between the second P-well and the N-well. A P-type semiconductor structure may be formed in the P-well. Two N-type semiconductor structures may be formed in the second P-well and the N-well, respectively. A contact of the P-type semiconductor structure may be electrically coupled to a contact of the N-type semiconductor structure in the second P-well. The two contacts may constitute the first terminal of the IC device. The contact of the N-type semiconductor structure in the N-well may constitute the second terminal of the IC device. The first P-well may have a greater dimension but lower dopant concentration than the second P-well or the N-well.

A device includes: a first silicon-controlled rectifier comprising a first PNP bipolar junction transistor (BJT) and a first NPN BJT in which bases and collectors are cross-coupled; and a field effect transistor (FET) configured to, based on an electrostatic discharge occurring between an anode of the first silicon-controlled rectifier and a cathode of the first silicon-controlled rectifier, trigger the first silicon-controlled rectifier. An emitter of the first PNP BJT corresponds to a plurality of first p+ regions being spaced apart from each other in a first direction. The FET is connected to the first silicon-controlled rectifier through at least one first n+ region disposed between the plurality of first p+ regions.

Embodiments of the disclosure provide an integrated circuit (IC) structure with resistive semiconductor material for a back well. The IC structure may include a semiconductor substrate having a deep well, and a device within a first portion of the deep well. The device includes a first doped semiconductor material coupled to a first contact, and a second doped semiconductor material coupled to a second contact. The deep well couples the first doped semiconductor material to the second doped semiconductor material. A first back well is within a second portion of the deep well. A first resistive semiconductor material is within the deep well and defines a boundary between the first portion of the deep well and the second portion of the deep well.

An integrated circuit includes a first horizontal conductor and a second horizontal conductor. The integrated circuit includes a first diode between a first first-type block and a first second-type block, a second diode between a second first-type block and a second second-type block, and a third diode between a third first-type block and a third second-type block. The first first-type block and the first second-type block are aligned along a first column. The second first-type block and the second second-type block are aligned along a second column. The third first-type block and the third second-type block are aligned along a third column. The second first-type block is connected to the first second-type block through the second horizontal conductor. The third first-type block is conductively connected to the second second-type block through the first horizontal conductor.

A semiconductor device that includes an n-buried layer, a p-well region over the n-buried layer, an n-channel MOSFET that includes an n-drain region, and a vertical NPN BJT having a collector that is the n-drain region and a base that is the p-well region. The p-well region is floating.

The present disclosure relates to semiconductor structures and, more particularly, to vertically stacked diode-trigger silicon controlled rectifiers and methods of manufacture. The structure includes: a silicon controlled rectifier in a trap rich region of a semiconductor substrate; and at least one diode built in polysilicon (gate material) and isolated by a gate-dielectric.