Various embodiments of the present disclosure are directed towards a method for forming an integrated chip. The method includes forming an epitaxial structure having a first doping type over a first portion of a semiconductor substrate. A second portion of the semiconductor substrate is formed over the epitaxial structure and the first portion of the semiconductor substrate. A first doped region having the first doping type is formed in the second portion of the semiconductor substrate and directly over the epitaxial structure. A second doped region having a second doping type opposite the first doping type is formed in the second portion of the semiconductor substrate, where the second doped region is formed on a side of the epitaxial structure. A plurality of fins of the semiconductor substrate are formed by selectively removing portions of the second portion of the semiconductor substrate.

A solid-state imaging device includes: a first semiconductor substrate including a photoelectric conversion element; and a second semiconductor substrate including at least a part of a peripheral circuit arranged in a main face of the second semiconductor substrate, the peripheral circuit generating a signal based on the charge of the photoelectric conversion element, a main face of the first semiconductor substrate and the main face of the second semiconductor substrate being opposed to each other with sandwiching a wiring structure therebetween; a pad to be connected to an external terminal; and a protection circuit electrically connected to the pad and to the peripheral circuit, wherein the protection circuit is arranged in the main face of the second semiconductor substrate.

The present disclosure provides a motherboard and a manufacturing method for the motherboard, the motherboard includes at least one display area, a periphery area surrounding the at least one display area, a plurality of test terminals, an electrostatic discharge line, a plurality of resistors and at least one thin film transistor. The plurality of test terminals are respectively electrically connected to the electrostatic discharge line through the plurality of resistors. At least one of the plurality of resistors includes an inorganic nonmetal trace. The at least one thin film transistor includes an active layer, and the inorganic nonmetal trace includes a same semiconductor matrix material as the active layer of the at least one thin film transistor.

A semiconductor device is provided. The semiconductor device includes an input/output cell, a core logic circuit, a first power supply cell, a second power supply cell, a third power supply cell and a fourth power supply cell. Each of the power supply cells includes a protection circuit and a bidirectional diode.

An intergrated circuit (IC) package includes a die, a package substrate coupled to the die, and a first electrostatic discharge (ESD) protection component coupled to the package substrate, where the first electrostatic discharge (ESD) protection component is configured to provide package level electrostatic discharge (ESD) protection. In some implementations, the first electrostatic discharge (ESD) protection component is embedded in the package substrate. In some implementations, the die includes an internal electrostatic discharge (ESD) protection component configured to provide die level electrostatic discharge (ESD) protection. In some implementations, the internal electrostatic discharge (ESD) protection component and the first electrostatic discharge (ESD) protection component are configured to provide cumulative electrostatic discharge (ESD) protection for the die.

A through-silicon via structure is provided. A semiconductor substrate has a first surface and a second surface, and the second surface is opposite to the first surface. A TSV extends from the first surface to the second surface of the semiconductor substrate. An N-type doped region surrounds the TSV and extends from the first surface to the second surface of the semiconductor substrate. A P-type well region is formed in the semiconductor substrate and surrounds the N-type doped region. A P-type doped region is formed in the P-type well region and surrounds the N-type doped region. The junction of the P-type well region and the N-type doped region forms an electrostatic discharge protection diode.

A device is disclosed that includes a first transistor, a second transistor, and a first PODE device. The second transistor is electrically coupled to the first transistor. The first PODE device is adjacent to a drain/source region of the second transistor. A control end of the first PODE device is electrically coupled to a drain/source end of the second transistor.

Methods of forming 3-D ICs with integrated passive devices (IPDs) include stacking separately prefabricated substrates. An active device (AD) substrate has contacts on its upper portion. A ground plane is located between the AD substrate and an IPD substrate. The ground plane provides superior IPD to AD cross-talk attenuation.

An ESD protection device including a Si substrate with an ESD protection circuit formed at the surface of the substrate; pads formed on the Si substrate; a rewiring layer opposed to the surface of the Si substrate, which includes terminal electrodes electrically connected to the pads. The rewiring layer includes a SiN protection film formed on the surface of the Si substrate to cover parts of the pads except regions in contact with openings (contact holes) formed in a resin layer, and the resin layer that is lower in dielectric constant than the SiN protection film, and formed between the SiN protection film and the terminal electrodes. Thus, provided is a semiconductor device which can reduce the generation of parasitic capacitance, and eliminates variation in parasitic capacitance generated.

A semiconductor device includes a plurality of sets of external drive terminals in a marginal region along one long side of a rectangular semiconductor substrate, a plurality of sets of ESD protection circuits arranged in the marginal region and coupled to corresponding sets of the drive terminals, and a plurality of output circuits coupled to corresponding sets of the drive terminals. Each set of drive terminals in a plurality of n columns along a Y direction is laid out in a staggered arrangement with drive terminals in adjacent columns shifted relative to each other. Each output circuit includes n output units associated with n drive terminals of each set and arranged in one column in an X direction. By the arrangement, the drive terminals can be arranged at a narrower pitch, and the total width for n output units can be compacted into that of one output circuit.