A positive resist composition comprising a base polymer comprising recurring units (a) of an ammonium salt of a carboxylic acid having an iodized or brominated hydrocarbyl group and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group has a high sensitivity and resolution and forms a pattern of good profile with reduced edge roughness and improved dimensional uniformity.

An aqueous dispersion of a hydrophobically-modified alkali-soluble multistage polymer useful as a thickener affording high thickening efficiency and an aqueous coating composition comprising such aqueous dispersion showing good stability after heat aging without compromising stability upon addition of colorants.

A positive resist composition comprising a base polymer comprising recurring units having a nitrogen-containing tertiary ester structure exhibits a high sensitivity, high resolution, low edge roughness (LER, LWR) and small size variation, and forms a pattern of good profile after exposure and development.

A positive resist composition comprising a base polymer comprising recurring units having a nitrogen-containing tertiary ester structure exhibits a high sensitivity, high resolution, low edge roughness (LER, LWR) and small size variation, and forms a pattern of good profile after exposure and development.

A resist composition comprising a base polymer and a quencher in the form of an ammonium salt consisting of an ammonium cation having an iodized aromatic ring bonded to the nitrogen atom via a C.sub.1-C.sub.20 hydrocarbylene group which may contain an ester bond or ether bond and a carboxylate anion having an iodized or brominated hydrocarbyl group offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.

The present disclosure relates to compositions comprising a copolymer derived from a vinyl aromatic monomer, a (meth)acrylate monomer, an acid monomer, and a copolymerizable surfactant and compositions comprising the same. The (meth)acrylate monomer can be selected from a monomer having a theoretical glass transition temperature (T.sub.g) for its corresponding homopolymer of 0° C. or less or a hydrophobic (meth)acrylate monomer. In some embodiments, the copolymer is further derived from an organosilane. The copolymers can have a theoretical glass transition temperature (T.sub.g) from −60° C. to 80° C. and a number average particle size of 250 nm or less. The compositions can be used to prepare compositions such as coatings that have improved water resistance, blush resistance, and/or resistance to hydrostatic pressures. Methods of making the copolymers are also provided.

Provided is a polymer compound having a repeating unit represented by Formula 1A below:

##STR00001##

wherein in Formula 1A, Z.sup.1 represents a hydrogen atom or a monovalent group, R.sup.1 represents a group represented by Formula 1B, L.sup.1 represents a divalent group, n represents an integer of 1 or more, and in in Formula 1B, L.sup.2 represents a single bond or a divalent group, R.sup.2 represents a group selected from the group consisting of a hydroxy group and a group represented by *—OR.sup.3, R.sup.3 represents a hydrocarbon group which may have a hetero atom, a plurality of R.sup.3's may be bonded to each other to form a ring, * represents a bonding position, m represents an integer of 1 to 5, and a plurality of L.sup.1's and a plurality of R.sup.2's may be the same as or different from each other.

Provided is a polymer compound having a repeating unit represented by Formula 1A below:

##STR00001##

wherein in Formula 1A, Z.sup.1 represents a hydrogen atom or a monovalent group, R.sup.1 represents a group represented by Formula 1B, L.sup.1 represents a divalent group, n represents an integer of 1 or more, and in in Formula 1B, L.sup.2 represents a single bond or a divalent group, R.sup.2 represents a group selected from the group consisting of a hydroxy group and a group represented by *—OR.sup.3, R.sup.3 represents a hydrocarbon group which may have a hetero atom, a plurality of R.sup.3's may be bonded to each other to form a ring, * represents a bonding position, m represents an integer of 1 to 5, and a plurality of L.sup.1's and a plurality of R.sup.2's may be the same as or different from each other.

Resins and formulations of individual monomers bearing both vinyl ester and epoxy functionality were either synthesized or formulated such that vinyl ester components capable of polymerizing by photo-induced, free radical polymerization were mixed with step-growth epoxy-amine systems, facilitating sequential cure. The vinyl ester component was photopolymerized using vat photopolymerization (VPP). Additionally, the preparation of bio-based photo curable thermosetting resins that have tailorable thermal and mechanical properties is provided. All monomers and polymers described herein are useful in a variety of applications, including additive manufacturing applications.

Resins and formulations of individual monomers bearing both vinyl ester and epoxy functionality were either synthesized or formulated such that vinyl ester components capable of polymerizing by photo-induced, free radical polymerization were mixed with step-growth epoxy-amine systems, facilitating sequential cure. The vinyl ester component was photopolymerized using vat photopolymerization (VPP). Additionally, the preparation of bio-based photo curable thermosetting resins that have tailorable thermal and mechanical properties is provided. All monomers and polymers described herein are useful in a variety of applications, including additive manufacturing applications.