H05H1/0037

FEEDBACK DETECTION FOR A TREATMENT DEVICE

A system includes a focus optic configured to converge an electromagnetic radiation (EMR) beam to a focal region located along an optical axis. The system also includes a detector configured to detect a signal radiation emanating from a predetermined location along the optical axis. The system additionally includes a controller configured to adjust a parameter of the EMR beam based in part on the signal radiation detected by the detector. The system also includes a window located a predetermined depth away from the focal region, between the focal region and the focus optic along the optical axis, wherein the window is configured to make contact with a surface of a tissue.

FEEDBACK DETECTION FOR A TREATMENT DEVICE

A system includes a focus optic configured to converge an electromagnetic radiation (EMR) beam to a focal region located along an optical axis. The system also includes a detector configured to detect a signal radiation emanating from a predetermined location along the optical axis. The system additionally includes a controller configured to adjust a parameter of the EMR beam based in part on the signal radiation detected by the detector. The system also includes a window located a predetermined depth away from the focal region, between the focal region and the focus optic along the optical axis, wherein the window is configured to make contact with a surface of a tissue.

FEEDBACK DETECTION FOR A TREATMENT DEVICE

A system includes a focus optic configured to converge an electromagnetic radiation (EMR) beam to a focal region located along an optical axis. The system also includes a detector configured to detect a signal radiation emanating from a predetermined location along the optical axis. The system additionally includes a controller configured to adjust a parameter of the EMR beam based in part on the signal radiation detected by the detector. The system also includes a window located a predetermined depth away from the focal region, between the focal region and the focus optic along the optical axis, wherein the window is configured to make contact with a surface of a tissue.

MULTIPLE PLASMA ION SOURCE FOR INLINE SECONDARY ION MASS SPECTROMETRY

Methods leverage premixed gas mixtures to perform a metrology process on a substrate using an inline secondary ion mass spectrometry (SIMS) process. The premixed gas mixture of two or more gases is injected into a plasma chamber that is configured to produce sputtering ions for the inline SIMS process. The two or more gases produce non-metallic ion species which are compatible with downstream substrate fabrication processes and allow further fabrication to be performed on the substrate after the inline SIMS process has completed. The sputtering ions are ejected from the plasma chamber into a magnetic field. The intensity of the magnetic field is altered to select a single species of ions. The single species of ions are directed towards a surface of the substrate and secondary ions sputtered from the surface of the substrate by the selected species of ions are detected and analyzed.

Systems and methods for Thomson scattering background interference suppression

An apparatus for measurement of Thomson scattering signals from a plasma includes a light emitting device, configured to emit a light beam into the plasma, along an axis. In addition, the apparatus includes a collector configured to collect the Thomson scattering from the plasma at an angle less than 90 degrees from the axis of the light beam. Further, the apparatus includes a sensor assembly to detect the Thomson scattering.

Glow plasma gas measurement signal processing
11948774 · 2024-04-02 · ·

Methods and apparatus for determination of the gas composition of a sample gas using glow discharge optical emission spectroscopy, in which the method comprises: generating one or more oscillating electromagnetic fields within a plasma cell to excite particles within the cell, to produce a glow discharge plasma in the plasma cell, and controlling the operating conditions for the plasma cell while flowing a gas mixture through the plasma cell to maintain glow discharge optical emissions from the plasma within a desired operating range; and monitoring one or more glow discharge optical emissions from the plasma in the plasma cell by measuring the optical emissions, or measuring a signal that correlates with the optical emissions, at twice the plasma excitation frequency; and processing the signal during each excitation cycle of the electromagnetic excitation, to determine the concentration of a gas within a gas mixture flowing through the plasma cell.

ICP analyzer
10490395 · 2019-11-26 · ·

An ICP analyzer 100 includes a self-oscillation radio-frequency power supply unit 120 for supplying radio-frequency power for generating plasma to an induction coil 111 wound around a plasma torch 110. To check the type of plasma torch 110, the analyzer 100 further includes: a frequency measurement section 121 for measuring an output frequency of the power supply unit 120; a storage unit 190 holding a reference output frequency for each type of plasma torch; and a torch checker 132 for determining whether or not the output frequency measured by the frequency measurement section 121 after the plasma is lit agrees with any one of the reference output frequencies, and for giving notification of the determination result.

Feedback detection for a treatment device

A system includes a focus optic configured to converge an electromagnetic radiation (EMR) beam to a focal region located along an optical axis. The system also includes a detector configured to detect a signal radiation emanating from a predetermined location along the optical axis. The system additionally includes a controller configured to adjust a parameter of the EMR beam based in part on the signal radiation detected by the detector. The system also includes a window located a predetermined depth away from the focal region, between the focal region and the focus optic along the optical axis, wherein the window is configured to make contact with a surface of a tissue.

ELECTRON CAPTURE DISSOCIATION (ECD) UTILIZING ELECTRON BEAM GENERATED LOW ENERGY ELECTRONS
20190287775 · 2019-09-19 ·

Electron capture dissociation (ECD) is performed by transmitting an electron beam through a cell along an electron beam axis, generating plasma in the cell by energizing a gas with the electron beam, and transmitting an ion beam through the interaction region along an ion beam axis to produce fragment ions. Generating the plasma forms an interaction region in the cell spaced from and not intersecting the electron beam, and including low-energy electrons effective for ECD. The ion beam axis may be at an angle to and offset from the ion beam axis, such that the electron beam does not intersect the ion beam.

Plasma torch

Disclosed is a demountable tube for a plasma torch assembly, such as an ICP torch assembly. The tube includes an open tubular body for radially surrounding a plasma within the tubular body. The tubular body may comprise a wall; and a mounting feature projecting from the tubular body for at least one of: (i) controlling alignment of the tubular body with respect to a mounting portion of the torch assembly, and (ii) releasably securing the tubular body to a portion of the torch assembly. The tubular body may also have a transmission zone that is partially devoid of said wall and includes at least one hole through said wall. The tube may be opaque. A plasma torch and ICP spectroscopy system are also disclosed.