There is provided a high-definition active matrix substrate while suppressing an occurrence of pixel defects. The active matrix substrate includes a first semiconductor film corresponding to one of two sub-pixels adjacent to each other in a row direction, a second semiconductor film corresponding to the other of two sub-pixels, a transistor using part of the first semiconductor film as a channel in the row direction, and a pixel electrode connected to a drain electrode of the transistor through a contact hole. In a plan view, a distance (dc) in the row direction from a drain electrode-side edge of the channel to a bottom surface of the contact hole is 0.15 or more times a sub-pixel pitch (dp) in the row direction.

There is provided a display device including: a light emitting element; and a drive transistor (DRTr) that includes a coupling section (W1) and a plurality of channel sections (CH) coupled in series through the coupling section (W1), wherein the drive transistor (DRTr) is configured to supply a drive current to the light emitting element.

An array substrate and a method for producing the same are disclosed. The array substrate includes a metal pattern and an electrically conductive pattern sequentially formed on a base substrate, the electrically conductive pattern being insulated from the metal pattern. The array substrate further includes a static charge releasing pattern formed in a same layer and made of a same material as the electrically conductive pattern, and which is insulated from the electrically conductive pattern. The metal pattern is a signal line running through a display area of the array substrate, and includes an input end, an output end, and a body portion between the input end and the output end. The output end of the signal line includes an island-like structure, and a width of the island-like structure is greater than that of the body portion. The static charge releasing pattern is electrically connected with the island-like structure.

A display array substrate, a manufacturing method and a display are disclosed herein. The display array substrate includes an array substrate base, an electroluminescent diode array substrate arranged above the array substrate base, including an anode layer, a cathode layer, an electroluminescent EL layer between the anode layer and the cathode layer, and a pixel compensation circuit layer on a side close to the array substrate base. The cathode layer is on a side away from the array substrate base. A photosensitive signal collector may be configured to receive an optical signal reflected by valleys and ridges of a finger and emitted by the electroluminescent EL layer, and convert the collected optical signal into an electrical signal to be output. The photosensitive signal collector may be arranged between the pixel compensation circuit layer and the anode layer of the electroluminescent diode array substrate.

The present application discloses an array substrate, a display apparatus and a method of fabricating an array substrate. The array substrate has a plurality of first bottom-gate type thin film transistors each of which including a metal oxide active layer and a plurality of second bottom-gate type thin film transistors each of which including a silicon active layer.

An array substrate, a display panel and a method for manufacturing the array substrate are provided. The array substrate further includes a first via and a second via. A conductive layer fills the first via and the second via to electrically connect the first metal layer and the second metal layer. The first via is disposed on a side of the second via, and a passivation layer partially extends between the first via and the second via. The display panel includes the above-mentioned array substrate.

Provided are a display substrate, a preparation method thereof, and a display device. The display substrate includes: a substrate, a thin film transistor disposed in a pixel island region of the substrate, a first signal line disposed in the pixel island region and a first connecting bridge disposed in a bridge region of the substrate, wherein the first connecting bridge is electrically connected to a gate of the thin film transistor.

The present application discloses a display panel, a manufacturing method and a display apparatus. The display panel includes: a first substrate; a first metal layer formed on the first substrate; a second metal layer; and a black color resistance layer formed between the first metal layer and the second metal layer; the first metal layer is a scan line, the second metal layer is a data line, and an insulating layer and the black color resistance layer are disposed at the intersection of the scan line and the data line.

The disclosure provides a bonding structure of a lateral side of a display panel, including an array substrate, a color filter, an inner circuit, and a lateral circuit. By defining a through hole in a gate insulating layer, a second metal layer may be directly connected to a first metal layer, thereby reducing layers flaked off from a glass when a lateral side of the glass is edged.

A display device includes a pixel connected to a scan line, and a data line crossing the scan line, wherein the pixel includes a light-emitting element, a driving transistor configured to control a driving current supplied to the light-emitting element according to a data voltage applied from the data line, and a first switching transistor configured to apply the data voltage of the data line to the driving transistor according to a scan signal that is applied to the scan line. The driving transistor includes a first active layer including an oxide semiconductor, and a first oxide layer disposed on the first active layer and including an oxide semiconductor. The first switching transistor includes a second active layer including an oxide semiconductor, and the first oxide layer is not disposed on the second active layer.