Patent classifications
H01L27/1237
DISPLAY DEVICE, METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC APPARATUS INCLUDING THE SAME
A display device includes: a substrate; and a plurality of pixel circuits on the substrate comprising: an active layer including a first region and a second region; a gate insulating layer on the active layer, the gate insulating layer including a first insulating layer overlapping the first region and the second region, a second insulating layer on the first insulating layer and overlapping the first region, and a third insulating layer on the second insulating layer and overlapping the first region and the second region; and a first conductive layer on the gate insulating layer, the first conductive layer including a first gate electrode overlapping the first region to form a driving transistor, and a second gate electrode overlapping the second region to form a switching transistor.
Thin Film Transistor Substrate and Display Device Comprising the Same
A thin film transistor substrate and a display device comprising the same are provided. The thin film transistor substrate comprises a first thin film transistor and a second thin film transistor on a base substrate, wherein the first thin film transistor includes a first active layer on the base substrate, and a first gate electrode spaced apart from the first active layer, the second thin film transistor includes a second active layer on the base substrate, and a second gate electrode spaced apart from the second active layer, and a mobility of the first active layer is greater than a mobility of the second active layer.
Display apparatus including a substrate having a hole
A display apparatus includes a substrate including at least one hole disposed in a hole area of the substrate, a thin film transistor disposed on the substrate, a light-emitting component disposed on the substrate and electrically connected to the thin film transistor, an insulating layer disposed on the substrate, a thin film encapsulation layer disposed on the substrate, and a laser blocking layer. The substrate includes a display area and a non-display area that is disposed between the display area and the hole area. The laser blocking layer is disposed on the insulating layer in the non-display area.
Display device and production method for display device
A display device according to the disclosure includes a substrate, a first transistor provided on the substrate, and a second transistor provided on the substrate, not overlapping the first transistor. The first transistor includes a polycrystalline silicon layer provided on the substrate, a first insulating film provided on the polycrystalline silicon layer, a first gate electrode provided on the first insulating film, and a second insulating film provided on the first gate electrode. The second transistor includes an oxide semiconductor layer provided on the first insulating film, a third insulating film provided on the oxide semiconductor layer, and a second gate electrode provided on the third insulating film. The first and third insulating films are SiOx films. The second insulating film is an SiNx film including hydrogen, and is provided overlapping the polycrystalline silicon layer, and is provided not overlapping the oxide semiconductor layer.
Display substrate and method for forming the same and display device
A display substrate, a method for forming the display substrate and a display device are provided. The display substrate includes: a first conductive pattern located on a base substrate, where a ring-shaped conductive protection structure is arranged at an edge of a preset region of the first conductive pattern and surrounds the preset region, and the conductive protection structure is made of an anti-dry-etching material; an insulation layer covering the first conductive pattern; and a second conductive pattern located on a side of the insulation layer away from the first conductive pattern, where the second conductive pattern is electrically connected to the first conductive pattern through the via-hole.
Active matrix substrate and method for manufacturing same
An active matrix substrate includes a plurality of gate bus lines, a plurality of source bus lines located closer to the substrate side; a lower insulating layer that covers the source bus lines; an interlayer insulating layer that covers the gate bus lines; a plurality of oxide semiconductor TFTs disposed in association with respective pixel regions; a pixel electrode disposed in each of the pixel regions; and a plurality of source contact portions each of which electrically connects one of the oxide semiconductor TFTs to the corresponding one of the source bus lines, in which each of the oxide semiconductor TFTs includes an oxide semiconductor layer disposed on the lower insulating layer, a gate electrode disposed on a portion of the oxide semiconductor layer, and a source electrode formed of a conductive film, and each of the source contact portions includes a source contact hole, and a connection electrode.
Display device and manufacturing method thereof
A display device and a manufacturing method thereof are disclosed. The display device includes a base substrate and at least one pixel circuit provided on the base substrate. The pixel circuit includes a driving transistor, a first transistor, and a second transistor; the base substrate includes a semiconductor body that can be doped, and a first conductive layer and a second conductive layer that are on the semiconductor body; the first transistor includes a first doped region in contact with the first electrode of the first transistor, and a second doped region in contact with a second electrode of the first transistor, and the first doped region of the first transistor and the second doped region of the first transistor are spaced apart from each other, have a same doping type, and are both in the semiconductor body.
Array substrate and display panel
The present invention provides an array substrate and a display panel, the array substrate comprises: a first metal layer comprising a plurality of gate routings and a plurality of common electrode routings, at least one of the plurality of common electrode routings is arranged discontinuously and comprises a plurality of common electrode spacers spaced apart from each other; a second metal layer comprising a plurality of common electrode connecting portions; and a first insulating layer provided with a plurality of first through holes, adjacent two of the plurality of common electrode spacers are electrically connected to a common electrode connecting portion through two of the plurality of first through holes.
Display device and driving method of the same
The present specification provides a display device and a driving method thereof performing sampling for sensing a sampling voltage of a driving transistor using a fast mode in which a driving transistor operates by a sampling voltage formed in one storage capacitor, and data writing using the slow mode in which the driving transistor is operated by a data voltage formed in another storage capacitor.
ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF
The present disclosure provides an array substrate, a manufacturing method thereof, and a display device. The array substrate includes a substrate, at least one first thin film transistor, and at least one second thin film transistor. A second etching barrier block is disposed between an active layer and a first source electrode, and the first drain electrode is close to the active layer, thereby shortening an effective channel of the first thin film transistor, so that a mobility of transistors and a number of pixels of a panel can be improved.