An array substrate, a display panel, and a method of fabricating an array substrate are provided. The array substrate includes a display region and a non-display region. The array substrate further includes a substrate, a first transparent layer disposed on the substrate corresponding to the display region, an interlayer insulating layer disposed on the substrate, and a second transparent layer disposed on the interlayer insulating layer.

A method for manufacturing an optical device includes providing a carrier waver, provide a first substrate having a first surface region, and forming a first gallium and nitrogen containing epitaxial material overlying the first surface region. The first epitaxial material includes a first release material overlying the first substrate. The method also includes patterning the first epitaxial material to form a plurality of first dice arranged in an array; forming a first interface region overlying the first epitaxial material; bonding the first interface region of at least a fraction of the plurality of first dice to the carrier wafer to form bonded structures; releasing the bonded structures to transfer a first plurality of dice to the carrier wafer, the first plurality of dice transferred to the carrier wafer forming mesa regions on the carrier wafer; and forming an optical waveguide in each of the mesa regions, the optical waveguide configured as a cavity to form a laser diode of the electromagnetic radiation.

An object is to provide a display device with excellent display characteristics, where a pixel circuit and a driver circuit provided over one substrate are formed using transistors which have different structures corresponding to characteristics of the respective circuits. The driver circuit portion includes a driver circuit transistor in which a gate electrode layer, a source electrode layer, and a drain electrode layer are formed using a metal film, and a channel layer is formed using an oxide semiconductor. The pixel portion includes a pixel transistor in which a gate electrode layer, a source electrode layer, and a drain electrode layer are formed using an oxide conductor, and a semiconductor layer is formed using an oxide semiconductor. The pixel transistor is formed using a light-transmitting material, and thus, a display device with higher aperture ratio can be manufactured.

The object of the present invention is to make it possible to form an LTPS TFT and an oxide semiconductor TFT on the same substrate. A display device includes a substrate having a display region in which pixels are formed. The pixel includes a first TFT using an oxide semiconductor 109. An oxide film 110 as an insulating material is formed on the oxide semiconductor 109. A gate electrode 111 is formed on the oxide film 110. A first electrode 115 is connected to a drain of the first TFT via a first through hole formed in the oxide film 110. A second electrode 116 is connected to a source of the first TFT via a second through hole formed in the oxide film 110.

A curved display panel and a method for manufacturing the same are provided. The curved display panel includes a plurality of clock buses, the clock buses extend along a first direction and are arranged along a second direction, the widths of the plurality of clock buses are different in the second direction, so that capacitance values between several clock buses and a clock signal line disconnected from the several clock buses are the same.

A method of forming an array substrate, the array substrate and a display device are provided. The method of forming the array substrate includes: in a case that a display unit is formed on one of two opposite surfaces of a base substrate and a driving circuit is formed on the other of the two opposite surfaces of the base substrate, performing a roughening treatment on edge regions of the two opposite surfaces of the base substrate and a side surface of the base substrate connecting the edge regions of the two opposite surfaces, to form a roughened region; and forming, at the roughened region, a metal wiring connecting a signal input terminal of the display unit and a signal output terminal of the driving circuit.

Provided are a driving backplane, a method for manufacturing the same and a display device. The driving backplane includes a substrate, a first gate disposed on a side of the substrate, an active layer disposed on a side of the first gate away from the substrate, and a second gate disposed on a side of the active layer away from the substrate. An orthographic projection of the second gate on the substrate is located in an orthographic projection of the first gate on the substrate, and in a direction parallel to the substrate, an edge of an orthographic projection of the first gate on the substrate extends beyond an edge of the orthographic projection of the second gate on the substrate.

Embodiments of the present disclosure provide a display substrate, a touch display panel and a display panel. The display substrate has a display region and a pin region on a side of the display region. The display substrate includes: a base substrate;

and at least one first signal line and at least one second signal line both on a side of the base substrate and both extending to the display region from the pin region. The display substrate further includes a DC conductive structure connected to a constant DC voltage. The DC conductive structure is between the at least one first signal line and the at least one second signal line. Each of the at least one first signal line and the at least one second signal line is spaced apart from the DC conductive structure.

An active matrix substrate includes gate bus lines; source bus lines; a lower insulating layer; an oxide semiconductor TFT; and a pixel electrode, in which the oxide semiconductor TFT includes an oxide semiconductor layer disposed on the lower insulating layer, a gate electrode, a source electrode, and a first ohmic conductive portion that is coupled to the oxide semiconductor layer and the source electrode, the lower insulating layer includes a source opening portion exposing at least a portion of the source electrode, the first ohmic conductive portion is disposed on the lower insulating layer and in the source opening portion and is in direct contact with at least the portion of the source electrode in the source opening portion, and the first region of the oxide semiconductor layer is in direct contact with an upper surface of the first ohmic conductive portion.

A display device according to an exemplary embodiment of the present disclosure comprises an insulation layer on a substrate and having a groove concave in a direction toward the substrate; a first reflective layer on at least a portion of the insulation layer; and a display element layer on the insulation layer and the first reflective layer, the display element layer including a light emitting element overlapping at least a portion of the groove.