An array substrate, a fabrication method of the array substrate and a mask, where a metal film is provided on a substrate, a first groove and a second groove are formed on the metal film, the bottom surface of the first groove is closer to the substrate compared to that of the second groove, a projection of the first groove on a plane parallel to the substrate is located within that of the second groove, thereby reducing a slope of a notch sidewall, avoiding the sliding of formed subsequent film layers off the first notch sidewall; the metal film may be covered by the subsequent film layers, improving the performance of the array substrate.

An organic light-emitting diode (OLED) display panel and a method for manufacturing the same are provided. The OLED display panel at least includes a thin film transistor (TFT) array substrate, a passivation layer, a planarization layer, and planarization-compensating layer. The planarization layer has a first planarization part corresponding to a light-emitting area, and a second planarization part corresponding to a defining area and a part of the light-emitting area. Height of a surface of the planarization-compensating layer from the surface of the TFT array substrate and height of a surface of the second planarization part from the surface of the TFT array substrate are level.

A light-emitting panel, a method making same, and a display panel are disclosed in the present disclosure. The light-emitting panel includes a light-emitting board which includes a substrate; a first metal layer disposed on the substrate; a gate insulating layer covering the first metal layer; and a second metal layer on a side of the gate insulating layer away from the first metal layer. The second metal layer includes a connection portion located in the bonding area of the light-emitting board, and a conductive protection layer formed by chemical plating is disposed on a surface of the connection portion.

This disclosure provides a display device, an array substrate, a thin film transistor and a fabrication method thereof. The thin film transistor includes an active layer, a gate insulating layer, a gate electrode, a dielectric layer, a source electrode and a drain electrode. The active layer has a channel region, doped regions at both sides of the channel region, and buffer regions each of which arranged between the corresponding doped region and the channel region, and a doping concentration of the buffer regions is less than that of the doped regions. The gate insulating layer is at a side of the active layer, covers the channel region and the buffer regions, and exposes the doped regions. The gate electrode is on a surface of the gate insulating layer facing away from the active layer.

An array substrate, a display device and a fabrication method are provided. The array substrate includes a first metal layer at one side of a base substrate, the first metal layer including a light shielding part, a source, a drain in a display area; a second metal layer at a side, facing away from an active layer, of gate insulating layer, the second metal layer includes a gate, a source-landing electrode a drain-landing electrode in the display area, the source-landing electrode is in contact with the active layer and the source through a first via hole penetrating through the gate insulating layer and a buffer layer and exposing one end of the active layer, the drain-landing electrode is in contact with the active layer and the drain through a second via hole penetrating through the gate insulating layer and the buffer layer and exposing other end of the active layer.

A display panel provided in embodiments of the present disclosure comprises a substrate, at least one metal layer, a darkening layer, and a functional layer, wherein the at least one metal layer is disposed on the substrate, the darkening layer covers the at least one metal layer, and the functional layer covers the darkening layer. An adhesive force of a photoresist to the functional layer is greater than an adhesive force of the photoresist to the darkening layer, and an adhesive force of the functional layer to the darkening layer is greater than the adhesive force of the photoresist to the darkening layer.

A manufacturing method of display panel, a display panel and a display device are disclosed. The manufacturing method includes following steps: providing a substrate, forming a first barrier layer on the substrate, forming a conductive layer on the first barrier layer, forming a second barrier layer on the conductive layer, forming a photoresist pattern on the second barrier layer, and then performing a plasma treatment on the photoresist pattern to form a first gap between the photoresist pattern and the second barrier layer.

A mask assembly includes a frame including a frame opening, and a mask disposed on the frame. The mask includes a body portion including an upper surface and a lower surface opposing each other and deposition openings spaced apart from each other, protrusions protruding from the upper surface and surrounding the corresponding deposition openings, and at least one step formation pattern overlapping the protrusions in a plan view and disposed in the body portion.

An array substrate and manufacturing method thereof, display panel and display device. The manufacturing method of the array substrate includes: forming, on a substrate, a first conductive pattern, a second conductive pattern and an insulating pattern, the insulating pattern at least covering an upper surface of the first conducting pattern, the first conductive pattern including a first amorphous transparent conductive pattern and a first metal pattern, and the second conductive pattern including a second amorphous transparent conductive pattern; and performing an annealing treatment to convert the first amorphous transparent conductive pattern and the second amorphous transparent conductive pattern to a first crystalline transparent conductive pattern and a second crystalline transparent conductive pattern respectively. The method addresses the problem in which a metal surface is readily oxidizable when performing an annealing treatment, thereby improving the product yield.

Embodiments of the present disclosure provide an array substrate including a plurality of pixel regions arranged in an array and a black matrix located between the pixel regions, the black matrix including an outward convex curved surface, wherein a material of the black matrix include metal, metal oxide, and metal nitride. The array substrate provided by the present disclosure can effectively reduce the reflectivity of the display panel and improve the image quality.