A semiconductor device includes an insulating substrate, a first semiconductor layer formed of silicon and positioned above the insulating substrate, a second semiconductor layer formed of a metal oxide and positioned above the first semiconductor layer, a first insulating film formed of a silicon nitride and positioned between the first semiconductor layer and the second semiconductor layer, and a block layer positioned between the first semiconductor film and the second semiconductor layer, the block layer hydrogen diffusion of which is lower than that of the first insulating film.

Provided are a pixel driving circuit, a display panel, and a display device. Both a constant voltage signal line and a variable voltage signal line extend along a first direction. The constant voltage signal line includes an initialization voltage line, and the variable voltage signal line includes an initialization control signal line. A first electrode of an initialization transistor is electrically connected to the initialization voltage line, a second electrode of the initialization transistor is electrically connected to a first electrode or a second electrode of a drive transistor, and a gate of the initialization transistor is electrically connected to the initialization control signal line and used for turning on the initialization transistor according to a control signal on the initialization control signal line so as to initialize the first electrode or the second electrode of the drive transistor.

The object of the present invention is to make it possible to form an LIPS TFT and an oxide semiconductor TFT on the same substrate. A display device includes a substrate having a display region in which pixels are formed. The pixel includes a first TFT using an oxide semiconductor 109. An oxide film 110 as an insulating material is formed on the oxide semiconductor 109. A gate electrode 111 is formed on the oxide film 110. A first electrode 115 is connected to a drain of the first TFT via a first through hole formed in the oxide film 110. A second electrode 116 is connected to a source of the first TFT via a second through hole formed in the oxide film 110.

A display device is disclosed, which includes: a first substrate; an oxide semiconductor layer disposed on the first substrate; a silicon semiconductor layer disposed on the first substrate; and a capacitor including a first conductive component and a second conductive component, wherein the first conductive component is electrically connected to the oxide semiconductor layer and the second conductive component is electrically connected to the silicon semiconductor layer.

An organic light emitting diode display includes a driving transistor and a compensation transistor. The driving transistor includes a first gate electrode disposed on a substrate, a polycrystalline semiconductor layer disposed on the first gate electrode of the driving transistor and including a first electrode, a second electrode, and a channel, and a second gate electrode disposed on the polycrystalline semiconductor layer of the driving transistor. The compensation transistor includes a polycrystalline semiconductor layer including a first electrode, a second electrode, and a channel, and a gate electrode disposed on the polycrystalline semiconductor layer of the compensation transistor.

A display device includes: a substrate; and a semiconductor layer disposed on the substrate, and including a first area, a second area, and a third area that are sequentially positioned by dividing the semiconductor layer into three areas in a thickness direction of the semiconductor layer, wherein the semiconductor layer includes polycrystalline silicon, a concentration of fluorine contained in the semiconductor layer has a first peak value in the first area and a second peak value in the third area, and the first peak value of the concentration of the fluorine in the semiconductor layer is about 30% or less of the second peak value of the concentration of the fluorine in the semiconductor layer.

The present application discloses a semiconductor device and a method for fabricating the semiconductor device. The semiconductor device includes a substrate, a gate structure positioned on the substrate, and a plurality of word lines positioned apart from the gate structure, wherein a top surface of the gate structure and top surfaces of the plurality of word lines are at a same vertical level.

An organic light emitting diode display device are provided. The organic light emitting diode display device includes: a substrate; a barrier layer, located on a side of the substrate; a first buffer layer, located on a side of the barrier layer; a first semiconductor layer, located on a side of the first buffer layer; a first gate insulating layer, located on a side of the first semiconductor layer; a first gate electrode, located on a side of the first gate insulating layer; a second buffer layer, located on a side of the first gate electrode; a second semiconductor layer, located on a side of the second buffer layer; a second gate insulating layer, located on a side of the second semiconductor layer; a second gate electrode, located on a side of the second gate insulating layer.

The present application relates to a display panel, a display screen and a display terminal. The display panel comprises a substrate provided with pixel circuits thereon; a pixel-defining layer; a light-emitting structure layer; a first electrode layer disposed on the pixel circuits and comprising a plurality of first electrodes; a second electrode disposed on the light emitting structure layer and being a surface electrode; and a scanning line and a data line both connected to each of the pixel circuits; wherein, sub-pixels in adjacent sub-pixel rows are staggered with one another and/or sub-pixels in adjacent sub-pixel columns are staggered with one another; the scanning line supplies a voltage to the pixel circuit to control turning-on and turning-off of the pixel circuit, and when the pixel circuit is turned on, a drive current from the data line is directly supplied to the first electrode to control light-emitting of the corresponding sub-pixel.

Thin film transistors having U-shaped features are described. In an example, integrated circuit structure including a gate electrode above a substrate, the gate electrode having a trench therein. A channel material layer is over the gate electrode and in the trench, the channel material layer conformal with the trench. A first source or drain contact is coupled to the channel material layer at a first end of the channel material layer outside of the trench. A second source or drain contact is coupled to the channel material layer at a second end of the channel material layer outside of the trench.