B08B1/04

SUBSTRATE CLEANING DEVICE AND SUBSTRATE PROCESSING DEVICE
20220402003 · 2022-12-22 · ·

The disclosure provides a substrate cleaning device and a substrate processing device capable of suppressing erroneous rotation detection of an optical sensor due to adhesion of droplets or mist. A substrate cleaning device includes a substrate cleaning part for cleaning a substrate, a drive roller for rotating the substrate, a driven roller rotated by the substrate, and a rotation detection part for detecting rotation of the driven roller. The rotation detection part includes a detected part provided on the driven roller, an optical sensor for detecting rotation of the detected part by irradiation with detection light, and a liquid filling part for filling an optical path forming space in which an optical path of the detection light is formed with a liquid having transmittance.

Apparatus and method for cleaning wafer handling equipment
11524319 · 2022-12-13 · ·

A cleaning assembly for cleaning one or more wafer edge handling contact surfaces of wafer handling equipment includes a substrate and a cleaning ring. The substrate includes an edge portion that extends about the body of the substrate. The cleaning ring is reversibly attachable to the edge portion of the substrate. The cleaning ring is formed from a deformable material. The substrate and cleaning ring are sized for compatibility with a front opening unified pod (FOUP) or a wafer cassette of a semiconductor fabrication facility.

Apparatus and method for cleaning wafer handling equipment
11524319 · 2022-12-13 · ·

A cleaning assembly for cleaning one or more wafer edge handling contact surfaces of wafer handling equipment includes a substrate and a cleaning ring. The substrate includes an edge portion that extends about the body of the substrate. The cleaning ring is reversibly attachable to the edge portion of the substrate. The cleaning ring is formed from a deformable material. The substrate and cleaning ring are sized for compatibility with a front opening unified pod (FOUP) or a wafer cassette of a semiconductor fabrication facility.

Aquaculture net cleaning system
11523595 · 2022-12-13 ·

An apparatus for cleaning aquaculture nets underwater. The appartus employs a propeller housing with a centrally disposed axis with a plurality of propeller blades extending therefrom. An outer perimeter ring secured to an outer tip of each propeller blade with a plurality of knuckles secured to the outer perimeter ring. Each knuckle including a curved surface constructed and arranged to strike the aquaculture net upon rotation of the blades for removal of growth by impact and shaking of the aquaculture net.

CLEANING APPARATUS FOR ROTOR BLADES
20220388687 · 2022-12-08 ·

A device having an opening with an edge, whereby on at least one side region of this edge, at least one cleaning element is located, and a support element for limiting the rotation of the opening about a rotation axis and for absorbing compressive forces is arranged on an opposite further side region, and wherein the opening is arranged in a frame which is tiltably connected to a holder via a joint providing the axis of rotation, so that both the at least one cleaning element and the support element can be rested against the rotor blade.

CLEANING APPARATUS FOR ROTOR BLADES
20220388687 · 2022-12-08 ·

A device having an opening with an edge, whereby on at least one side region of this edge, at least one cleaning element is located, and a support element for limiting the rotation of the opening about a rotation axis and for absorbing compressive forces is arranged on an opposite further side region, and wherein the opening is arranged in a frame which is tiltably connected to a holder via a joint providing the axis of rotation, so that both the at least one cleaning element and the support element can be rested against the rotor blade.

RADIOPHARMACEUTICAL PIG CLEANING AND TRANSPORTATION SYSTEM

A pig cleaning and transportation system is disclosed. Exemplary implementations include a platform with a plurality of apertures; a plurality of securing mechanisms, each mechanism within each aperture and configured to hold a pig and allow it to rotate around its longitudinal axis; a base underneath the platform; and a cleaning element connected to the base and positioned on each longitudinal side of the platform in pressure contact with the pigs on the plurality of securing mechanisms, each cleaning element including at least one cleaning material surface.

RADIOPHARMACEUTICAL PIG CLEANING AND TRANSPORTATION SYSTEM

A pig cleaning and transportation system is disclosed. Exemplary implementations include a platform with a plurality of apertures; a plurality of securing mechanisms, each mechanism within each aperture and configured to hold a pig and allow it to rotate around its longitudinal axis; a base underneath the platform; and a cleaning element connected to the base and positioned on each longitudinal side of the platform in pressure contact with the pigs on the plurality of securing mechanisms, each cleaning element including at least one cleaning material surface.

Substrate cleaning device

A substrate cleaning device that facilitates control of the amount of liquid supplied to a substrate and reduces adverse influences of the liquid supplied to a bearing part on the substrate is provided. The substrate cleaning device includes: a holding part that has a bearing part configured to rotatably hold a cleaning member for cleaning a substrate; a first supply part that has at least a part provided inside the holding part and supplies a first liquid into the cleaning member through the inside of the holding part; and a second supply part that supplies a second liquid to the bearing part.

Substrate cleaning device

A substrate cleaning device that facilitates control of the amount of liquid supplied to a substrate and reduces adverse influences of the liquid supplied to a bearing part on the substrate is provided. The substrate cleaning device includes: a holding part that has a bearing part configured to rotatably hold a cleaning member for cleaning a substrate; a first supply part that has at least a part provided inside the holding part and supplies a first liquid into the cleaning member through the inside of the holding part; and a second supply part that supplies a second liquid to the bearing part.