B23K26/386

FORMING LINED COOLING APERTURE(S) IN A TURBINE ENGINE COMPONENT

A manufacturing method is provided. During this method, a preform component is provided for a turbine engine. The preform component includes a substrate. A meter section of a cooling aperture is formed in the substrate. An internal coating is applied onto a surface of the meter section. An external coating is applied over the substrate. A diffuser section of the cooling aperture is formed in the external coating and the substrate to provide the cooling aperture.

APPARATUS AND METHOD FOR AUTOMATED MANUFACTURING OF STRUCTURES WITH ELECTRICALLY CONDUCTIVE SEGMENTS
20230010200 · 2023-01-12 ·

An apparatus and method of fabricating particles composed of metals, conducting polymers, semiconductors, and composites of such materials are provided. The method includes application of an editing tool, such as a laser, for patterning an editable structure that mounted on an electrically conductive substrate. Portions of the editable structure may be removed so as to allow electrodeposition.

FORMING LINED COOLING APERTURE(S) IN A TURBINE ENGINE COMPONENT

A manufacturing method is provided. During this method, a preform component is provided for a turbine engine. The preform component includes a substrate. A meter section of a cooling aperture is formed in the substrate. An internal coating is applied onto a surface of the meter section. An external coating is applied over the substrate. A diffuser section of the cooling aperture is formed in the external coating and the substrate to provide the cooling aperture.

METHOD FOR PRODUCING FINE STRUCTURES IN THE VOLUME OF A SUBSTRATE COMPOSED OF HARD BRITTLE MATERIAL

A method for producing a cavity in a substrate composed of hard brittle material is provided. A laser beam of an ultrashort pulse laser is directed a side surface of the substrate and is concentrated by a focusing optical unit to form an elongated focus in the substrate. Incident energy of the laser beam produces a filament-shaped flaw in a volume of the substrate. The filament-shaped flaw extends into the volume to a predetermined depth and does not pass through the substrate. To produce the filament-shaped flaw, the ultrashort pulse laser radiates in a pulse or a pulse packet having at least two successive laser pulses. After at least two filament-shaped flaws are introduced, the substrate is exposed to an etching medium which removes material of the substrate and widens the at least two filament-shaped flaws to form filaments. At least two filaments are connected to form a cavity.

SYSTEMS FOR AND METHODS OF FORMING MICRO-HOLES IN GLASS-BASED OBJECTS USING AN ANNULAR VORTEX LASER BEAM

The systems and methods disclosed herein utilize a beam-forming system configured to convert a Gaussian laser beam into an annular vortex laser beam having a relatively large depth of focus, which enables the processing of thick or stacked glass-based objects annular laser beam is defined in part by a topological charge m that defines an amount of rotation of the annular vortex beam around its central axis as it propagates annular vortex beam is used to form micro-holes in a glass-based object using either a one-step or a two-step method micro-holes formed by either process can be in the form of recesses or through-holes, depending on the application size of the micro-holes can be controlled by controlling the size of the annular vortex beam over the depth of focus range.

SYSTEMS FOR AND METHODS OF FORMING MICRO-HOLES IN GLASS-BASED OBJECTS USING AN ANNULAR VORTEX LASER BEAM

The systems and methods disclosed herein utilize a beam-forming system configured to convert a Gaussian laser beam into an annular vortex laser beam having a relatively large depth of focus, which enables the processing of thick or stacked glass-based objects annular laser beam is defined in part by a topological charge m that defines an amount of rotation of the annular vortex beam around its central axis as it propagates annular vortex beam is used to form micro-holes in a glass-based object using either a one-step or a two-step method micro-holes formed by either process can be in the form of recesses or through-holes, depending on the application size of the micro-holes can be controlled by controlling the size of the annular vortex beam over the depth of focus range.

Manufacturing Apparatus and Manufacturing Method of Electrode for Secondary Battery Using Laser, and Electrode for Secondary Battery Manufactured by the Same

Provided are a manufacturing apparatus and a manufacturing method of an electrode for a secondary battery which forms a large number of holes in the electrode mixture having a level difference in thickness, by irradiating twice or less with a nanosecond laser, and an electrode for a secondary battery manufactured by the same.

MULTI-STEP METHOD FOR MACHINING BLIND OPE1NING IN CERAMIC COMPONENT
20230070114 · 2023-03-09 ·

A method of machining includes removing material from a target region of a ceramic component to form a blind opening in the ceramic component via removing a bulk of the material by a laser machining operation and then removing a remainder of the material by a mechanical machining operation.

MULTI-STEP METHOD FOR MACHINING BLIND OPE1NING IN CERAMIC COMPONENT
20230070114 · 2023-03-09 ·

A method of machining includes removing material from a target region of a ceramic component to form a blind opening in the ceramic component via removing a bulk of the material by a laser machining operation and then removing a remainder of the material by a mechanical machining operation.

REAL-TIME MODIFICATION OF LINE FOCUS INTENSITY DISTRIBUTION
20220326539 · 2022-10-13 ·

Methods, systems, devices, and substrates are described. In some examples, an apparatus may include optical components configured to adjust an input to a laser cutting optic for modifying a substrate (e.g., an optically transmissive substrate). In some examples, the optical components may include a beam deflector, a first optic configured to output a first laser beam with a first beam width, and a second optic configured to output a second laser beam with a second beam width. In some examples, the beam deflector may modify an optical path of a pulsed laser (e.g., through the first optic or through the second optic), which may result in an input to the laser cutting optic having a beam width corresponding to the first optic or the second optic. The different input beam widths may modify a line focus intensity of an output of the laser cutting optic when modifying the substrate.