B81C1/0069

Thermal compensation of lens assembly focus using image sensor shift
11708263 · 2023-07-25 ·

A camera system incorporating a MEMS actuator to achieve focus adjustments to compensate for the thermal expansion of the lens assembly is disclosed. The camera comprises a lens barrel, lens holder, infra-red (IR) filter, board circuit, MEMS actuator, housing package for the actuator, and an image sensor. The image sensor is directly wire bonded to pads on the circuit board such that these pads are movable at the image sensor end and fixed at the circuit board end. When the camera is exposed to temperature variations, the MEMS actuator moves the sensor along the optical axis to maintain the image in focus.

MEMs membrane structure and method of fabricating same

Disclosed is a method of fabricating a MEMS membrane structure. The method comprises: forming a silicon oxide film dam structure on a silicon substrate; depositing an adhesive layer and then forming a sacrificial layer; depositing a surface protective film on the sacrificial layer; etching the surface protective film and the sacrificial layer, thus forming trenches of first to third rows on the silicon oxide film dam structure; depositing a support film inside of the trenches of first to third rows and on the surface protective film of the sacrificial layer, thus forming a membrane; and removing the sacrificial layer disposed inside the support film deposited inside of the trench of first row, thus forming an empty space.

SYSTEM AND METHOD FOR AN OVENIZED SILICON PLATFORM USING Si/SiO2 HYBRID SUPPORTS
20170275157 · 2017-09-28 · ·

The present invention generally relates to an ovenized platform and a fabrication process thereof. Specifically, the invention relates to an ovenized hybrid Si/SiO.sub.2 platform compatible with typical CMOS and MEMS fabrication processes and methods of its manufacture. Embodiments of the invention may include support arms, CMOS circuitry, temperature sensors, IMUs, and/or heaters among other elements.

Laterally-doped MEMS resonator

A microelectromechanical system (MEMS) resonator includes a substrate having a substantially planar surface and a resonant member having sidewalls disposed in a nominally perpendicular orientation with respect to the planar surface. Impurity dopant is introduced via the sidewalls of the resonant member such that a non-uniform dopant concentration profile is established along axis extending between the sidewalls parallel to the substrate surface and exhibits a relative minimum concentration in a middle region of the axis.

MEMS DEVICES AND METHODS OF FORMING THEREOF

A method of forming a MEMS device includes providing a substrate having a device stopper. The device stopper is integral to the substrate and formed of the substrate material. A thermal dielectric isolation layer may be arranged over the device stopper and the substrate. A device cavity may be formed in the substrate and the thermal dielectric isolation layer. The thermal dielectric isolation layer and the device stopper at least partially surround the device cavity. An active device layer may be formed over the thermal dielectric isolation layer and the device cavity.

MEMS resonator with co-located temperature sensor

A microelectromechanical system (MEMS) resonator includes a substrate having a substantially planar surface and a resonant member having sidewalls disposed in a nominally perpendicular orientation with respect to the planar surface. Impurity dopant is introduced via the sidewalls of the resonant member such that a non-uniform dopant concentration profile is established along axis extending between the sidewalls parallel to the substrate surface and exhibits a relative minimum concentration in a middle region of the axis.

MEMS devices and methods of forming thereof

A method of forming a MEMS device includes providing a substrate having a device stopper. The device stopper is integral to the substrate and formed of the substrate material. A thermal dielectric isolation layer may be arranged over the device stopper and the substrate. A device cavity may be formed in the substrate and the thermal dielectric isolation layer. The thermal dielectric isolation layer and the device stopper at least partially surround the device cavity. An active device layer may be formed over the thermal dielectric isolation layer and the device cavity.

THERMAL COMPENSATION OF LENS ASSEMBLY FOCUS USING IMAGE SENSOR SHIFT

A camera system incorporating a MEMS actuator to achieve focus adjustments to compensate for the thermal expansion of the lens assembly is disclosed. The camera comprises a lens barrel, lens holder, infra-red (IR) filter, board circuit, MEMS actuator, housing package for the actuator, and an image sensor. The image sensor is directly wire bonded to pads on the circuit board such that these pads are movable at the image sensor end and fixed at the circuit board end. When the camera is exposed to temperature variations, the MEMS actuator moves the sensor along the optical axis to maintain the image in focus.

Process for manufacturing an optical microelectromechanical device having a tiltable structure with an antireflective surface

For manufacturing an optical microelectromechanical device, a first wafer of semiconductor material having a first surface and a second surface is machined to form a suspended mirror structure, a fixed structure surrounding the suspended mirror structure, elastic supporting elements which extend between the fixed structure and the suspended mirror structure, and an actuation structure coupled to the suspended mirror structure. A second wafer is machined separately to form a chamber delimited by a bottom wall having a through opening. The second wafer is bonded to the first surface of the first wafer in such a way that the chamber overlies the actuation structure and the through opening is aligned to the suspended mirror structure. Furthermore, a third wafer is bonded to the second surface of the first wafer to form a composite wafer device. The composite wafer device is then diced to form an optical microelectromechanical device.

MICRO-ELECTRO MECHANICAL SYSTEM AND MANUFACTURING METHOD THEREOF

A micro electro mechanical system (MEMS) includes a circuit substrate comprising electronic circuitry, a support substrate having a recess, a bonding layer disposed between the circuit substrate and the support substrate, through holes passing through the circuit substrate to the recess, a first conductive layer disposed on a front side of the circuit substrate, and a second conductive layer disposed on an inner wall of the recess. The first conductive layer extends into the through holes and the second conductive layer extends into the through holes and coupled to the first conductive layer.