Patent classifications
C03C2204/08
GLASS SUBSTRATE
A glass substrate 10 has a mark provided on a surface 10A of the glass substrate 10, the mark including plural dots 104, a depth H of each of the dots 104 is 0.5 μm or larger and 7.0 μm or smaller, and an inclination angle of a side surface 104B of each of the dots 104 is 5° or larger and 56° or smaller.
METHOD FOR MANUFACTURING A GLASS-CERAMIC ARTICLE
A process for the manufacture of a glass-ceramic article exhibiting properties of resistance to scratches, greasy marks, adhesion of dirt and light scattering. The glass-ceramic article includes a surface, the surface arithmetic roughness of which is between 2 μm and 7 μm and the roughness being obtained using a chemical surface treatment. The glass-ceramic article is particularly suitable for use as a cooking surface and/or as surface for the preparation of foodstuffs.
GLASS WITH NANOSCALE SURFACE FEATURES FROM THERMAL POLING AND METHODS FOR FORMING THE SAME
A glass substrate with modified surface regions is disclosed. The glass substrate includes a first side and an opposite second side, an alkali-containing bulk disposed between the first and second sides, and a first alkali-depleted region formed in the alkali-containing bulk on the first side. The first alkali-depleted region defines at least a portion of a first topographical feature. The first topographic feature includes a height that extends in a first direction from a base portion of the first topographical feature to an outermost portion of the first topographical feature. The first direction is oriented parallel to a thickness of the glass substrate between the first and second sides. The first topographic feature also includes a width that extends in a second direction between at least two, spaced apart wall portions of the first topographical feature. The second direction is oriented normal to the first direction.
Alkali-free borosilicate glasses with low post-HF etch roughness
An article comprises a glass substrate. The glass substrate has a first surface having a plurality of vias therein, and a second surface parallel to the first surface. At least one of the first surface and the second surface is an etched surface having a surface roughness (Ra) of 0.75 nm or less. The glass substrate comprises, in mol percent on an oxide basis: 65 mol %≤SiO.sub.2≤75 mol %; 7 mol %≤Al.sub.2O.sub.3≤15 mol %; 26.25 mol %≤RO+Al.sub.2O.sub.3−B.sub.2O.sub.3; 0 mol %≤R.sub.2O≤2 mol %. RO=MgO+CaO+SrO+BaO+ZnO. R.sub.2O=Li.sub.2O+Na.sub.2O+K.sub.2O+Rb.sub.2O+Cs.sub.2O.
Glass substrate for high-frequency device and circuit board for high-frequency device
A glass substrate for a high-frequency device, which contains SiO.sub.2 as a main component, the glass substrate having a total content of alkali metal oxides in the range of 0.001-5% in terms of mole percent on the basis of oxides, the alkali metal oxides having a molar ratio represented by Na.sub.2O/(Na.sub.2O+K.sub.2O) in the range of 0.01-0.99, and the glass substrate having a total content of alkaline earth metal oxides in the range of 0.1-13% in terms of mole percent on the basis of oxides, wherein at least one main surface of the glass substrate has a surface roughness of 1.5 nm or less in terms of arithmetic average roughness Ra, and the glass substrate has a dielectric dissipation factor at 35 GHz of 0.007 or less.
GLASS WITH MODIFIED SURFACE REGIONS AND METHODS AND APPARATUSES FOR FORMING THE SAME VIA ELECTRO-THERMAL POLING AND FIELD-ASSISTED ION EXCHANGE
A glass substrate with modified surface regions is disclosed. The glass substrate includes an alkali-containing bulk, a first alkali-depleted region, a second alkali-depleted region, and a first ion-exchanged region. The alkali-containing bulk has a first surface and a second surface with the first and second surfaces on opposite sides. The first alkali-depleted region extends into the alkali-containing bulk from the first surface. The second alkali-depleted region extends into the alkali-containing bulk from the second surface. The first ion-exchanged region extends into the alkali-containing bulk from the first surface. The first alkali-depleted region, the second alkali-depleted region, and the first ion-exchanged region each have a substantially homogenous composition. A method of forming the glass substrate is disclosed. The method includes simultaneously forming the first alkali-depleted region and the first ion-exchanged region in the first surface. The method also includes near-simultaneously forming the second alkali-depleted region in the second surface.
Fused quartz container having low levels of surface defects
A quartz glass container is shown and described herein. The quartz glass container exhibits a low concentration of surface defects on an inner surface of the container. In aspects hereof, the container may have a surface defect density of 50 or fewer surface defects per square centimeter within a 1 cm band centered 1 cm from the base of the container.
Textured glass for light extraction enhancement of OLED lighting
A textured glass substrate along with articles comprising a textured glass substrate and methods of making are provided. The substrates retain the mechanical and optical properties of the untextured glass, while the process provides a reliable and low cost, easy scale up method. The resulting glass substrates are of particular use for light extraction in organic light emitting diode structures.
Glass member
A glass member includes a recessed portion, wherein in cross-sectional view, an angle formed between a principal surface of the glass member and an edge face of an opening of the recessed portion is 90 degrees to 130 degrees.
Large-size synthetic quartz glass substrate, evaluation method, and manufacturing method
A large-size synthetic quartz glass substrate has a diagonal length of at least 1,000 mm. Provided that an effective range is defined on the substrate surface, and the effective range is partitioned into a plurality of evaluation regions such that the evaluation regions partly overlap each other, a flatness in each evaluation region is up to 3 μm. From the quartz glass substrate having a high flatness and a minimal local gradient within the substrate surface, a large-size photomask is prepared.