C08G73/1035

THERMOPLASTIC MOULDING COMPOSITION CONTAINING POLYALKYLENE TEREPHTHALATE

The present invention relates to a thermoplastic molding compound comprising a polyalkylene terephthalate and a polyimide, wherein the molding compound has a single glass transition temperature in DSC measurement. The present invention further relates to the use thereof and to fibers, films and shaped bodies produced from the molding compound.

Polyamideimide resin and use thereof
11518852 · 2022-12-06 · ·

A polyamideimide resin having an isocyanate group blocked with a compound selected from the group consisting of alcohols, oximes and lactams, and having a carboxyl group blocked with a vinyl ether group-containing compound.

CURABLE RESIN COMPOSITION, DRY FILM AND CURED PRODUCT THEREOF, AND ELECTRONIC COMPONENT INCLUDING CURED PRODUCT
20220315704 · 2022-10-06 · ·

Provided is a curable resin composition having developability and resolution improved without degrading the heat resistance and the chemical resistance, furthermore, a curable resin composition that is useful as a PID material for optical uses or a material for optical sensor protective films and enables the formation of a cured product having both higher transparency and excellent heat resistance, a dry film containing the curable resin composition, a cured product thereof and a printed wiring board including the cured product. A curable resin composition containing (A) an amide-imide resin, (B) a compound having an ethylenic double bond and (C) a photopolymerization initiator, wherein the amide-imide resin (A) is a reaction product of an isocyanurate-type polyisocyanate synthesized from an isocyanate having an aliphatic structure and a tricarboxylic acid anhydride and has a number-average molecular weight of 500 to 1000.

Polyamideimide resin composition and flourine-based coating material
11674039 · 2023-06-13 · ·

Disclosed are a polyamideimide resin composition comprising (A) a polyamideimide resin, (B) a 3-alkoxy-N,N-dimethylpropanamide, and (C) water; and a fluorine-based coating material comprising the polyamideimide resin composition and a fluororesin.

Porous nanostructured polyimide networks and methods of manufacture

Porous three-dimensional networks of polyimide and porous three-dimensional networks of carbon and methods of their manufacture are described. For example, polyimide aerogels are prepared by mixing a dianhydride and a diisocyanate in a solvent comprising a pyrrolidone and acetonitrile at room temperature to form a sol-gel material and supercritically drying the sol-gel material to form the polyimide aerogel. Porous three-dimensional polyimide networks, such as polyimide aerogels, may also exhibit a fibrous morphology. Having a porous three-dimensional polyimide network undergo an additional step of pyrolysis may result in the three dimensional network being converted to a purely carbon skeleton, yielding a porous three-dimensional carbon network. The carbon network, having been derived from a fibrous polyimide network, may also exhibit a fibrous morphology.

Low toxicity solvent system for polyamideimide and polyamide amic acid resin coating

A polyamideimide and polyamide amic acid resin polymer that allows for reduced levels of toxicity in manufacturing. In an embodiment, a coating composition comprises at least one polyamideimide resin, at least one aprotic dialkylamide solvent and at least one co-solvent. In another embodiment, the at least one co-solvent is selected from a group consisting of methyl acetate, n-propyl acetate, t-butyl acetate, iso-butyl acetate, ethyl acetate, isopropyl acetate, methyl lactate, ethyl lactate, n-propyl lactate, isopropyl lactate, n-butyl lactate, isobutyl lactate, t-butyl lactate, cyclohexanone, cyclopentanone, n-butyl acetate, methyl alcohol, ethyl alcohol, isopropyl alcohol, n-acetyl morpholine, ε-caprolactone and methylcyclohexane.

Low toxicity solvent system for polyamdieimide and polyamide amic acid resin manufacture

Techniques and mechanisms to reduce toxicity in manufacturing of a polyamideimide and polyamide amic acid resin polymer. In an embodiment, a polyamideimide is produced using at least one aprotic dialkylamide solvent and at least one co-solvent. In another embodiment, the at least one co-solvent is selected from the group consisting of methyl actetate, n-propyl acetate, t-butyl acetate, iso-butyl acetate, ethyl acetate, isopropyl acetate, methyl lactate, ethyl lactate, n-propyl lactate, isopropyl lactate, n-butyl lactate, isobutyl lactate, t-butyl lactate, cyclohexanone, cyclopentanone, n-butyl acetate, methyl alcohol, ethyl alcohol, isopropyl alcohol, n-acetyl morpholine, ε-caprolactone and methylcyclohexane.

ELECTRICALLY-INSULATING RESIN COMPOSITION AND ELECTRICAL INSULATOR
20220230778 · 2022-07-21 ·

An electrically-insulating resin composition comprising a polyamide-imide resin, a silica fine particle and a dispersant having a phosphate ester group. This electrically-insulating resin composition can be used to provide an electrical insulator having excellent withstand voltage life characteristics against a surge voltage.

Poly(amide-imide) copolymer, method of manufacturing the same, poly(amide-imide) copolymer film, window for display device, and display device

A poly(amide-imide) copolymer including an amide structural unit having an amide bond in a polymer main chain and an imide structural unit having an imide bond in a polymer main chain, wherein at least one imide structural unit includes a moiety cross-linked to an adjacent polymer main chain through an amide bond.

Electrodeposition liquid and electrodeposition-coated article

Provided is an electrodeposition dispersion including a polyamide-imide resin, a polar solvent, water, a poor solvent, and a base, in which the polar solvent is an organic solvent having a boiling point of higher than 100° C. and D.sub.(S-P) represented by a formula (1) satisfying a relationship of D.sub.(S-P)<6, and a weight-average molecular weight of the polyamide-imide is 10×10.sup.4 to 30×10.sup.4 or a number-average molecular weight of the polyamide-imide is 2×10.sup.4 to 5×10.sup.4.
D.sub.(S-P)=[(dD.sup.S−dD.sup.P).sup.2+(dP.sup.S−dP.sup.P).sup.2+(dH.sup.S−dH.sup.P).sup.2].sup.1/2  (1)