Patent classifications
C23C16/4415
Surface mechanical attrition treatment (SMAT) methods and systems for modifying nanostructures
Described herein are systems and methods for performing a surface mechanical attrition treatment (SMAT) to the surface of a variety of materials including thin films, nanomaterials, and other delicate and brittle materials. In an aspect, a surface of a material is modified to a modified surface and from an original state to a modified state, wherein the modified state comprises a physical modification, a chemical modification, or a biological modification. In another aspect, a surface mechanical attrition treatment (SMAT) is applied to the modified surface of the material for a defined duration of time, wherein a condition associated with the SMAT is adjusted based on a structural composition of the material. In yet another aspect, a defined strain is imposed on the structural composition of the material based on the SMAT.
Surface mechanical attrition treatment (SMAT) methods and systems for modifying nanostructures
Described herein are systems and methods for performing a surface mechanical attrition treatment (SMAT) to the surface of a variety of materials including thin films, nanomaterials, and other delicate and brittle materials. In an aspect, a surface of a material is modified to a modified surface and from an original state to a modified state, wherein the modified state comprises a physical modification, a chemical modification, or a biological modification. In another aspect, a surface mechanical attrition treatment (SMAT) is applied to the modified surface of the material for a defined duration of time, wherein a condition associated with the SMAT is adjusted based on a structural composition of the material. In yet another aspect, a defined strain is imposed on the structural composition of the material based on the SMAT.
MIST COATING FORMING APPARATUS AND MIST COATING FORMING METHOD
A raw material solution mist-forming mechanism forms a mist from a raw material solution, which is a nanoparticle dispersion or a nanofiber dispersion, and obtains a raw material solution mist. A mist coating mechanism coats the raw material solution mist to a surface of a substrate to form an extremely thin liquid film of the raw material solution on the substrate surface. A baking and drying mechanism bakes and dries, on a hot plate, the substrate on the surface of which the extremely thin liquid film of the raw material solution is formed and evaporates a solvent in the extremely thin liquid film of the raw material solution to form, on the substrate surface, a thin film containing, as a constituent material, a nanoparticle raw material or a nanofiber raw material contained in the extremely thin liquid film of the raw material solution.
ENHANCING GAS-PHASE REACTION IN A PLASMA USING HIGH INTENSITY AND HIGH POWER ULTRASONIC ACOUSTIC WAVES
This invention relates to enhancing a gas-phase reaction in a plasma comprising: creating plasma by at least one plasma source, and wherein that the method further comprises: generating ultrasonic high intensity and high power acoustic waves having a predetermined amount of acoustic energy by at least one ultrasonic high intensity and high power gas-jet acoustic wave generator, where said ultrasonic high intensity and high power acoustic waves are directed to propagate towards said plasma so that at least a part of said predetermined amount of acoustic energy is absorbed into said plasma, and where a sound pressure level of said generated ultrasonic high intensity and high power acoustic waves is at least substantially 140 dB and where an acoustic power of said generated ultrasonic high intensity and high power acoustic waves is at least substantially 100 W.
Systems and methods for enhancing mobility of atomic or molecular species on a substrate at reduced bulk temperature using acoustic waves, and structures formed using same
Under one aspect, a structure is provided that includes a substrate including a first material having a threshold temperature above which the first material is damaged and a layer consisting essentially of a second material molecularly bonded to the first material of the substrate. The second material is formed on the substrate at a reaction temperature that is higher than the threshold temperature of the first material. An interface between the substrate and the second material is a substantially defect-free surface.
SURFACE MECHANICAL ATTRITION TREATMENT (SMAT) METHODS AND SYSTEMS FOR MODIFYING NANOSTRUCTURES
Described herein are systems and methods for performing a surface mechanical attrition treatment (SMAT) to the surface of a variety of materials including thin films, nanomaterials, and other delicate and brittle materials. In an aspect, a surface of a material is modified to a modified surface and from an original state to a modified state, wherein the modified state comprises a physical modification, a chemical modification, or a biological modification. In another aspect, a surface mechanical attrition treatment (SMAT) is applied to the modified surface of the material for a defined duration of time, wherein a condition associated with the SMAT is adjusted based on a structural composition of the material. In yet another aspect, a defined strain is imposed on the structural composition of the material based on the SMAT.