The invention relates to a sensor device for examining the coating of a disc as part of a coating process. The sensor device comprises a first optical sensor system for determining the layer thickness of the coating applied to the disc, and comprises a rotation apparatus. The invention is characterized in that the first optical sensor system is designed to simultaneously identify at least one first position-based measured value and one second position-based measured value, the first and the second position-based measured value describing the distance between the sensor systems and the surface of the disc. As a result of this, the sensor system is configured such that the first position-based measured value of a coated region of the disc and the second position-based measured value of an uncoated region of the disc are identified. Furthermore, the first optical sensor system comprises at least one linear guide, which extends from the central region to the edge. In addition, a control and analysis apparatus is provided for calculating the layer thickness of the disc at the position of the first position-based measured value with the aid of the first and the second position-based measured value. Furthermore, the invention relates to a coating for a disc, comprising inspecting the coating for determining the layer thickness of the coating applied to the disc.

The invention relates to a method for coating cavity walls, in particular cylinder bores of engine blocks, In the method, a coating is applied to a cavity wall using a coating lance. In addition, a cavity diameter is measured using a measuring apparatus. According to the invention, the method is characterized in that at least a plurality of diameter values of a first cavity are measured at different heights of the first cavity using the measuring apparatus, and in that a coating of variable thickness is applied to a wall of the first or a second cavity using the coaling lance, the thickness of said coating of variable thickness being dependent on the determined diameter values. The invention additionally describes a corresponding coating system.

Implementations disclosed describe, among other things, a system and a method of scanning a substrate with a beam of light and detecting for each of a set of locations of the substrate, a respective one of a set of intensity values associated with a beam of light reflected from (or transmitted through) the substrate. The detected intensity values are used to determine a profile of a thickness of the substrate.

A process of detecting a thickness of a film layer to be processed or a depth of etching by using a result of detection of a signal indicating intensity of interference light having a plurality of wavelengths formed at a plurality of time instants from when plasma is formed to when the etching is completed. A start time instant is detected by using an amount of change in the intensity of the interference light. Then, a remaining film thickness or the etching amount at an arbitrary time instant is detected from a result of comparing actual data indicating the intensity of the interference light at the arbitrary time instant during the processing after the start time instant with a plurality of pieces of data for detection of the intensity of the interference light obtained in advance and associated with values of a the film thicknesses or the depths of etching.

An apparatus for measuring the thickness of graphene oxide coatings deposited on a support substrate are described. The apparatus includes a light source and a photodetector which can be placed directly into a coating line to provide continuous feedback on the thickness of a fabricated graphene oxide coating, enabling fabrication of controlled thickness coatings and real-time quality monitoring.

A coating system may include a coating chamber; a substrate holder to move a substrate along a motion path; and a sensor device in the coating chamber, wherein the sensor device is configured to move along the motion path, and wherein the sensor device is to perform a spectral measurement on the substrate.

A plasma processing apparatus and method with an improved processing yield, the plasma processing apparatus including detector configured to detect an intensity of a first light of a plurality of wavelengths in a first wavelength range and an intensity of a second light of a plurality of wavelengths in a second wavelength range, the first light being obtained by receiving a light which is emitted into the processing chamber from a light source disposed outside the processing chamber and which is reflected by an upper surface of the wafer, and the second light being a light transmitted from the light source without passing through the processing chamber; and a determination unit configured to determine a remaining film thickness of the film layer by comparing the intensity of the first light corrected using a change rate of the intensity of the second light.

The disclosure relates to a device and method for coating thickness monitoring. The device comprises one or more lasers with different wavelengths, a light splitting optical element for beam splitting and beam combining of laser lights with different wavelengths, a diffuse plate, a driving motor, a lens, a multimode optical fiber, a light power meter, a test substrate and a coating fixture. The laser light is converted into partially coherent light through the rotating diffuse plate driven by a driving motor. The partially coherent light enters a multimode optical fiber through lens focusing, and is transmitted to a coating machine, collimated by a lens and then incident to a test substrate. The transmitted light enters a second multimode optical fiber after being focused by a lens, and is collimated and split at an optical fiber outlet. The light power meter is used for respectively measuring the power of the exiting light with different wavelengths and monitoring the transmissivities of lights with different wavelengths on the test substrate to realize the control of the coating thickness. The coating thickness monitoring device has the characteristics of simple structure, convenience in mounting, and narrow linewidth of the monitoring light source, and can realize the thickness control in a high-precision optical interference filter coating procedure.

A method of forming a vapour deposited polymeric conformal coating on a surface of a part (23). The method comprises placing the part (23) and a flow control screen in a deposition chamber (22); dispersing a gas into the chamber (22) from which the polymeric coating is deposited on the surface. The flow control screen is spaced apart from the surface and is configured to control a localised flow of the gas in the chamber so as to impose a structure on the deposited coating.

The disclosure relates to a method of determining a velocity profile for the movement of a substrate to be coated relative to a coating source.