A monitoring system and method are presented for use in monitoring a target. The monitoring system comprises: an input utility for receiving input data comprising measured data indicative of optical response of the target measured under predetermined conditions and comprising phase data indicative of a two-dimensional profile of full phase of the optical response of the target in a predetermined two-dimensional parametric space including a two-dimensional range in which said target exhibits phase singularity; an analyzer module for processing said measured data and extracting at least one phase singularity signature of the target characterizing the target status, the phase singularity signature being formed by a number N of phase singularity points, each corresponding to a condition that the physical phase continuously accumulates a nonzero integer multiple m of 2π around said point.

Provided is a pupil ellipsometry measurement apparatus configured to measure an object, the pupil ellipsometry measurement apparatus including a stage configured to support the object to be measured, a light source unit configured to generate and output light, an irradiation optical system configured to focus the light from the light source unit on the object, a first detector configured to detect an image of reflected light from the object on an imaging plane, a self-interference generator (SIG) configured to generate self-interference with respect to the reflected light, a second detector configured to detect a hologram image of interference light of the SIG on a pupil plane, and a processor configured to reconstruct reflectance information based on the hologram image, and measure the object.

A measurement system is disclosed. A measurement system includes an illumination module, a mirror module, a stage, and a detector. The illumination module includes a light source, an optical fiber, a collimating mirror, a polarization state generator, a beam control mirror, and a relay mirror. The mirror module includes a first beam splitter and a reflective objective mirror. The beam control mirror is movable to relay light received from the polarization state generator to various positions on the relay mirror.

Provided is a pupil ellipsometry measurement apparatus configured to measure an object, the pupil ellipsometry measurement apparatus including a stage configured to support the object to be measured, a light source unit configured to generate and output light, an irradiation optical system configured to focus the light from the light source unit on the object, a first detector configured to detect an image of reflected light from the object on an imaging plane, a self-interference generator (SIG) configured to generate self-interference with respect to the reflected light, a second detector configured to detect a hologram image of interference light of the SIG on a pupil plane, and a processor configured to reconstruct reflectance information based on the hologram image, and measure the object.

Methods and systems for performing simultaneous spectroscopic measurements of semiconductor structures over a broad range of angles of incidence (AOI), azimuth angles, or both, are presented herein. Spectra including two or more sub-ranges of angles of incidence, azimuth angles, or both, are simultaneously measured over different sensor areas at high throughput. Collected light is linearly dispersed across different photosensitive areas of one or more detectors according to wavelength for each subrange of AOIs, azimuth angles, or both. Each different photosensitive area is arranged on the one or more detectors to perform a separate spectroscopic measurement for each different range of AOIs, azimuth angles, or both. In this manner, a broad range of AOIs, azimuth angles, or both, are detected with high signal to noise ratio, simultaneously. This approach enables high throughput measurements of high aspect ratio structures with high throughput, precision, and accuracy.

System and method for use in optical monitoring of a sample. The system comprising: a light source unit (140) for providing collimated illumination; polarization modulation unit (160) located in optical path of light propagating from the light source unit; a lens unit (120) for focusing light onto an illumination spot on a surface of a sample, and for collection of light components returning from the sample; a light collection unit configured for collecting light returning from the sample and generate output image data associated with Fourier plane imaging with respect to surface of the sample; and a control unit (500) configured processing said data in accordance with said system calibration. The method provides calibration data, and comprising: providing reference data indicative of complex refractive index of the reference samples on at least two reference samples; collecting ellipsometry data for said at least two reference samples using the ellipsometry system, generating output data having a plurality of data pieces, each associated with unknown angular direction; and for each data piece corresponding to an unknown angular direction, determining simultaneously system parameters and angle of incidence in accordance with corresponding parameters of the reference data to thereby determine calibration data.

A device for measuring a large-area and massive scattered field in nanoscale. The device includes a polarization state generator disposed on an output optical path of a laser source, a polarization state analyzer operating to demodulate a polarized light beam emitted thereon, a first objective lens and a first lens disposed on an optical path of a sample stage, and a scanning mirror disposed on an optical path in front of or at the rear of the polarization state generator.

An apparatus and method for measuring a pretilt angle of a liquid crystal (LC) are disclosed. The method includes irradiating polarized light on an LC cell including a first substrate, a second substrate facing the first substrate, and an LC layer between the first substrate and the second substrate. At least one of the first substrate and the second substrate includes a minute branch electrode. Irradiated light is scanned within a predetermined angle range in a direction not parallel to the minute branch electrode, an intensity of light that is transmitted through the LC cell is detected, and a pretilt angle of the LC is obtained by using a light intensity detection signal corresponding to the transmitted light.

Methodology of characterizing surface properties and determining refractive index and extinction coefficient of a prism shaped material, including simultaneously for a multiplicity of wavelengths, using an easy to practice technique.

A measurement system is disclosed. A measurement system includes an illumination module, a mirror module, a stage, and a detector. The illumination module includes a light source, an optical fiber, a collimating mirror, a polarization state generator, a beam control mirror, and a relay mirror. The mirror module includes a first beam splitter and a reflective objective mirror. The beam control mirror is movable to relay light received from the polarization state generator to various positions on the relay mirror.