A method comprises the steps of: (a) Obtaining a measured X-ray spectrum for the coated sample, for determining characteristics for the sample and for a coating material; (b) Determining a simulated X-ray spectrum for the sample based on an initial sample composition; (c) Determining an adapted sample composition that improves a match between the characteristics of the sample and an adapted simulated X ray spectrum; (d) Determining an adapted coating thickness for the coating material based on the adapted sample composition and characteristics of the coating; and (e) Repeating the steps (b) to (d) using the adapted sample composition and the adapted coating thickness of the coating material instead of the initial values, wherein the coating thickness is used for determining an absorption of X-rays.

A method comprises the steps of: (a) Obtaining a measured X-ray spectrum for the coated sample, for determining characteristics for the sample and for a coating material; (b) Determining a simulated X-ray spectrum for the sample based on an initial sample composition; (c) Determining an adapted sample composition that improves a match between the characteristics of the sample and an adapted simulated X ray spectrum; (d) Determining an adapted coating thickness for the coating material based on the adapted sample composition and characteristics of the coating; and (e) Repeating the steps (b) to (d) using the adapted sample composition and the adapted coating thickness of the coating material instead of the initial values, wherein the coating thickness is used for determining an absorption of X-rays.

An embodiment of a shutter assembly is described that comprises a support structure with a number of stations and operatively coupled to a motor configured to translate each of the stations to a position in front of a detector, wherein a first station comprises a first aperture, a first charged particle filter, and a first window; and a second station comprises a second aperture larger than the first aperture, a second charged particle filter, and a second window thinner than the first window.

An embodiment of a shutter assembly is described that comprises a support structure with a number of stations and operatively coupled to a motor configured to translate each of the stations to a position in front of a detector, wherein a first station comprises a first aperture, a first charged particle filter, and a first window; and a second station comprises a second aperture larger than the first aperture, a second charged particle filter, and a second window thinner than the first window.

An object of the present invention is to improve the accuracy of clustering by avoiding detection of false clusters when automatically clustering points on a scatter diagram. A surface analyzer according to a first aspect of the present invention includes a measurement unit (1-2, 4-8) configured to acquire a signal reflecting a quantity of a plurality of components or elements that are analysis targets at a plurality of positions on a sample (3), a scatter diagram generation unit (92) configured to generate a binary scatter diagram based on a measurement result by the measurement unit, a clustering unit (94) configured to perform clustering of points in the binary scatter diagram using a method of a density-based clustering, and a parameter adjustment unit (93) configured to adjust a distance threshold by utilizing distribution information on a signal value of the components or the elements on either axis in the binary scatter diagram, the distance threshold being one of parameters to be set in the density-based clustering.

An object of the present invention is to improve the accuracy of clustering by avoiding detection of false clusters when automatically clustering points on a scatter diagram. A surface analyzer according to a first aspect of the present invention includes a measurement unit (1-2, 4-8) configured to acquire a signal reflecting a quantity of a plurality of components or elements that are analysis targets at a plurality of positions on a sample (3), a scatter diagram generation unit (92) configured to generate a binary scatter diagram based on a measurement result by the measurement unit, a clustering unit (94) configured to perform clustering of points in the binary scatter diagram using a method of a density-based clustering, and a parameter adjustment unit (93) configured to adjust a distance threshold by utilizing distribution information on a signal value of the components or the elements on either axis in the binary scatter diagram, the distance threshold being one of parameters to be set in the density-based clustering.

Systems and methods for fused multi-modal electron microscopy are provided to generate quantitatively accurate 2D maps or 3D volumes with pixel/voxel values that directly reflect a sample's chemistry. Techniques are provided for combining annular dark field detector (ADF), annular bright field (ABF) and/or pixelated detector image data and energy dispersive X-rays (EDX) data and/or electron energy loss spectroscopy (EELS) data for a sample and generating chemical 2D and 3D maps by applying minimization optimization process.

A radiation detector includes a radiation detection element, a circuit element, and a housing accommodating the radiation detection element and the circuit element, in which a closed space is provided. The housing has an unblocked opening portion, the closed space is disposed inside the housing, the circuit element is disposed in the closed space, and the closed space is decompressed or filled with an inert gas or a dry gas.

The purpose of the present invention is to increase accuracy of a specific test using an electronic microscope and improve work efficiency. Provided is a system that identifies test recipe information corresponding to an object to be tested on the basis of attribute information about a testing sample, and analyzes and evaluates the object to be tested contained in the testing sample by checking image data and element analysis data that are acquired by a measuring device in accordance with a control program for the test recipe information, against reference image data and reference element analysis data that are used as evaluation references for the object to be tested.

A method for inspecting a sample by means of a multi-beam charged particle inspection apparatus, and an apparatus for performing this method are provided. The multi-beam charged particle inspection apparatus is configured to project an array of charged particle beamlets within an exposure area on the sample. The apparatus includes a detection system for detecting X-Rays and/or cathodoluminescent light from the exposure area emitted by the sample due to an interaction of the array of charged particle beamlets with the sample. The method includes the steps of projecting the array of charged particle beamlets within the exposure area on the sample, and monitoring a combined emission of X-Rays and/or cathodoluminescent light from the interaction of substantially all charged particle beamlets of the array of charged particle beamlets with the sample.