A method and apparatus for inspecting a sample is provided. The apparatus includes a sample holder for holding the sample at a sample plane, a charged particle column for generating an array of multiple charged particle beamlets and directing the array towards the sample holder, a position sensor, and a control unit. The charged particle column includes an objective lens for focusing the charged particle beamlets of the array in an array of charged particle beam spots at or near the sample plane. The objective lens includes a magnetic lens common for all charged particle beamlets. The position sensor provides a signal which is dependent on the position of the sample. The control unit controls the position of the sample holder on the basis of the signal from the position sensor, to keep the pitch and/or orientation of the spots on the sample constant.

A method and apparatus for inspecting a sample is provided. The apparatus includes a sample holder for holding the sample at a sample plane, a charged particle column for generating an array of multiple charged particle beamlets and directing the array towards the sample holder, a position sensor, and a control unit. The charged particle column includes an objective lens for focusing the charged particle beamlets of the array in an array of charged particle beam spots at or near the sample plane. The objective lens includes a magnetic lens common for all charged particle beamlets. The position sensor provides a signal which is dependent on the position of the sample. The control unit controls the position of the sample holder on the basis of the signal from the position sensor, to keep the pitch and/or orientation of the spots on the sample constant.

[Object] An electric conductivity-measuring material which emits light according to electric conductivity of a measurement object; an electric conductivity-measuring film containing the material; and an electric conductivity-measuring device and an electric conductivity-measuring method using the electric conductivity-measuring film are provided. An electric resistivity-measuring material which emits light according to electric resistivity of a measurement object when electrons are made incident; an electric resistivity-measuring film containing the material; and an electric resistivity-measuring device and an electric resistivity-measuring method using the electric resistivity-measuring film are also provided. [Solution] An electric conductivity-measuring material is used, which contains at least one of a fluorescent substance, a luminescent substance, an electroluminescent substance, a fractoluminescent substance, a photochromic substance, an afterglow substance, a photostimulated luminescent substance and a mechanoluminescent substance.

[Object] An electric conductivity-measuring material which emits light according to electric conductivity of a measurement object; an electric conductivity-measuring film containing the material; and an electric conductivity-measuring device and an electric conductivity-measuring method using the electric conductivity-measuring film are provided. An electric resistivity-measuring material which emits light according to electric resistivity of a measurement object when electrons are made incident; an electric resistivity-measuring film containing the material; and an electric resistivity-measuring device and an electric resistivity-measuring method using the electric resistivity-measuring film are also provided. [Solution] An electric conductivity-measuring material is used, which contains at least one of a fluorescent substance, a luminescent substance, an electroluminescent substance, a fractoluminescent substance, a photochromic substance, an afterglow substance, a photostimulated luminescent substance and a mechanoluminescent substance.

The invention relates to a method of examining a sample using a charged particle microscope, comprising the steps of providing a charged particle beam, as well as a sample, and scanning said charged particle beam over said sample. A first detector is used for detecting emissions of a first type from the sample in response to the beam scanned over the sample. Using spectral information of detected emissions of the first type, a plurality of mutually different phases are assigned to said sample. An image representation of said sample is provided, wherein said image representation contains different color hues. The color hues are selected from a pre-selected range of consecutive color hues in such a way that the selected color hues comprise mutually corresponding intervals within said pre-selected range of consecutive color hues.

The invention relates to a method of examining a sample using a charged particle microscope, comprising the steps of providing a charged particle beam, as well as a sample, and scanning said charged particle beam over said sample. A first detector is used for detecting emissions of a first type from the sample in response to the beam scanned over the sample. Using spectral information of detected emissions of the first type, a plurality of mutually different phases are assigned to said sample. An image representation of said sample is provided, wherein said image representation contains different color hues. The color hues are selected from a pre-selected range of consecutive color hues in such a way that the selected color hues comprise mutually corresponding intervals within said pre-selected range of consecutive color hues.

A micro light-emitting diode (μLED) chip includes a first electrode layer, a second semiconductor layer located on a surface of the first electrode layer, and a first semiconductor layer located on a side of the second semiconductor layer away from the first electrode layer, and a light-emitting layer located between the first semiconductor layer and the second semiconductor layer. The second semiconductor is electrically connected to the first electrode layer, and is configured to transmit first carriers. The first semiconductor layer is configured to transmit second carriers. The light-emitting layer is configured to be excited to emit light upon combination of the first carriers and the second carriers. A surface of the first semiconductor layer away from the light-emitting layer is a concave-convex microstructure, and convex portions of the concave-convex microstructure are configured to receive an electron beam.

Methods for drift corrected, fast, low dose, adaptive sample imaging with a charged particle microscopy system include scanning a surface region of a sample with a charged particle beam to obtain a first image of the surface region with a first detector modality, and then determining a scan strategy for the surface region. The scan strategy comprises a charged particle beam path, a first beam dwell time associated with at least one region of interest in the first image, the first beam dwell time being sufficient to obtain statistically significant data from a second detector modality, and at least a second beam dwell time associated with other regions of the first image, wherein the first beam dwell time is different than the second beam dwell time. The surface region of the sample is then scanned with the determined scan strategy to obtain data from the first and second detector.

Methods for drift corrected, fast, low dose, adaptive sample imaging with a charged particle microscopy system include scanning a surface region of a sample with a charged particle beam to obtain a first image of the surface region with a first detector modality, and then determining a scan strategy for the surface region. The scan strategy comprises a charged particle beam path, a first beam dwell time associated with at least one region of interest in the first image, the first beam dwell time being sufficient to obtain statistically significant data from a second detector modality, and at least a second beam dwell time associated with other regions of the first image, wherein the first beam dwell time is different than the second beam dwell time. The surface region of the sample is then scanned with the determined scan strategy to obtain data from the first and second detector.

Methods for drift corrected, fast, low dose, adaptive sample imaging with a charged particle microscopy system include scanning a surface region of a sample with a charged particle beam to obtain a first image of the surface region with a first detector modality, and then determining a scan strategy for the surface region. The scan strategy comprises a charged particle beam path, a first beam dwell time associated with at least one region of interest in the first image, the first beam dwell time being sufficient to obtain statistically significant data from a second detector modality, and at least a second beam dwell time associated with other regions of the first image, wherein the first beam dwell time is different than the second beam dwell time. The surface region of the sample is then scanned with the determined scan strategy to obtain data from the first and second detector.