The present disclosure relates to a method for estimating parameters of a junction of a power semi-conductor element comprising: •—Detecting at least one stable on-line operating condition through measurements (2, 3, 4) of Von, Ion, Tc on a semi-conductor module (1) where Ion is a current for which the on-state voltage Von of the semi-conductor is sensitive to the temperature and Tc is the temperature of the casing of said semi-conductor element; •—Measuring and storing at least one parameter set Von, Ion, Tc of said at least one stable operating condition; •—in a calculating unit (52), providing calculations for minimizing the error between a junction temperature estimation Tj of an electrical model Tj=F(Von, Ion, θelec) comprising a first set of unknown parameters θelec and another junction temperature estimation Tjmod of a loss/thermal model Tj=G(lon, Tc, θ mod) comprising a second set of unknown parameters θ mod and obtaining at least one set of parameters θelec and at least one parameter θ mod providing minimization of said error; •—providing the calculated value of Tj with at least one of the calculated parameters sets θelec and/or θ mod and the measured Von, Ion, Tc; •—Storing the at least one parameters set θelec and/or θ mod and/or Tj.

Provided is a gate voltage determination apparatus of a MOS transistor having a gate electrode, a gate insulating film and a channel region, the gate voltage determination apparatus including: a characteristic acquisition unit configured to acquire current-voltage characteristics showing a relationship between a gate current flowing through the gate electrodes and a gate voltage when the gate voltage applied to the gate electrode is changed from a higher voltage side to a lower voltage side; and a voltage determination unit configured to determine, based on a value of the gate voltage at which the gate current shows a peak waveform in the current-voltage characteristics, an off-gate voltage to be applied to the gate electrode when turning off the MOS transistor.

A test structure for a buried gate transistor includes a substrate, a first test contact located on one side of a first transistor contact, a second test contact located on one side of a second transistor contact, and a layer buried in the substrate, having a doping greater than or equal to 10.sup.18 cm.sup.−3, and having a face which is tangent to the buried part of the gate. A first insulation structure is disposed between the first test contact and the first transistor contact and a second insulation structure is disposed between the second test contact and the second transistor contact. The first and second test contacts each have an end connected to the buried layer.

A method for in situ threshold voltage determination of a semiconductor device includes sourcing a current to a first terminal of the semiconductor device. A gate terminal of the semiconductor device is driven with a plurality of gate levels. Each gate level includes one of a plurality of different gate voltages. A transistor voltage is measured between the first terminal and a second terminal of the semiconductor device during each gate level. The respective gate voltage is stored in response to the semiconductor device voltage transitioning past a voltage limit. A temperature dependent threshold voltage of the semiconductor device is estimated for a first measured temperature measured during the storing of the stored gate voltage from a previously stored gate voltage and a second measure temperature.

A universal switching platform is configured to test a device under test, and includes a first power source, a first switch, a second switch and a second power source. The first switch, the second switch and the second power source are coupled in series between positive and negative terminals of the first power source. The common node of the first and second switches and the negative terminal of the first power source are configured to be respectively coupled to first and second terminals of the device under test. The universal switching platform provides a voltage and a current to test the device under test when the first and second switches are controlled to transition between conduction and non-conduction.

A drive device for driving a voltage-controlled semiconductor element. The drive device includes: a drive circuit connected to the gate of the semiconductor element via a gate resistor; a delay circuit connected to the drive circuit, for delaying a drive signal output from the drive circuit until a gate voltage of the semiconductor element enters a Miller effect period, which is a period during which the gate voltage transitionally changes, the gate voltage having temperature dependency on a chip temperature of the semiconductor element; a one-shot circuit connected to the delay circuit, for outputting a pulse signal with a pulse width shorter than the Miller effect period; a comparator that compares the gate voltage with a reference voltage; and an AND circuit that outputs an overheat detection signal in response to the gate voltage exceeding the reference voltage.

The degree of freedom of an abnormality detection target location in a solid-state imaging device in which a plurality of substrates are joined is improved. A semiconductor device includes a connection line and a detection circuit. A plurality of semiconductor substrates are joined in the semiconductor device. Then, in the semiconductor device, the connection line is wired across the plurality of semiconductor substrates. The detection circuit detects the presence or absence of an abnormality in a joint surface of the plurality of semiconductor substrates based on an energization state of the connection line when enable has been set by a predetermined control signal.

The multilayer test sample includes a stack with a bottom layer, a top layer, and a tunnel layer sandwiched between the bottom and top layers. The multilayer test sample has terminals below the stack for measuring on the stack. The terminals have unknown positions or distance between them. A model and a measurement strategy is defined so that material parameters of the stack may be determined.

An optical probe receives an optical signal output from a test subject. The optical probe includes an optical waveguide composed of a core portion and a cladding portion disposed on an outer periphery of the core portion, wherein an incident surface of the optical waveguide, which receives the optical signal, is a convex spherical surface with a constant curvature radius.

An apparatus is disclosed for robust transistor circuitry. In example implementations, an apparatus includes a current mirror and fault handler circuitry that is coupled to the current mirror. The current mirror includes a core transistor having a control terminal, a first transistor, and a second transistor. The first transistor has a control terminal that is coupled to the control terminal of the core transistor. The second transistor has a control terminal that is coupled to the control terminal of the core transistor. The fault handler circuitry is configured to select the first transistor or the second transistor to provide a mirrored current of the current mirror.