Patent classifications
G03F7/0295
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RESIST FILM, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
An actinic ray-sensitive or radiation-sensitive resin composition includes a salt including a sulfonium cation having an aryl group substituted with an acid-decomposable group-containing group and having at least three fluorine atoms; and a resin having a polarity that increases through decomposition by an action of an acid, in which the acid-decomposable group-containing group includes a group having a polarity that increases through decomposition by an action of an acid, and the acid-decomposable group-containing group includes no fluorine atom.
LITHOGRAPHIC PRINTING PLATES PRECURSORS COMPRISING A RADIATION SENSITIVE IMAGEABLE LAYER WITH A CROSSLINKED SURFACE
There are free radical scavengers of formula (P.sub.m-L).sub.n-T.sub.q. Also provided are negative-working lithographic printing plate precursors comprising a hydrophilic substrate and a NIR photopolymerizable or UV-violet photopolymerizable imageable layer coated on the hydrophilic layer, the imageable layer also being photopolymerizable by visible light, the imageable layer having an outer surface and a thickness, the outer surface of the imageable layer being uniformly, and partially or completely crosslinked down to a depth corresponding to at most about 70% of the thickness of the imageable layer.
COMPOUND, BINDER RESIN, NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, AND DISPLAY DEVICE COMPRISING BLACK BANK FORMED USING SAME
The present application relates to a compound of Chemical Formula 1, a binder resin, a negative-type photosensitive resin composition, and a display apparatus including a black bank formed using the same.
Lithographic printing plate precursor, method for making lithographic printing plate, organic polymer particle, and photosensitive resin composition
A lithographic printing plate precursor having an image-recording layer on a hydrophilic support, in which the image-recording layer includes an organic polymer particle, and the organic polymer particle is a reaction product obtained by at least reacting an aromatic polyvalent isocyanate compound having a structure represented by Formula PO and water, a method for making a lithographic printing plate having excellent printing resistance in the case of using an ultraviolet-curable ink in printing, a new organic polymer particle, and a resin composition including the organic polymer particle. ##STR00001##
Blue curable resin composition, blue color filter, and display device including same
A blue curable resin composition includes a colorant (A), a resin (B), a polymerizable compound (C) and a polymerization initiator (D). The colorant (A) includes two or more pigments each having a phthalocyanine backbone. The blue curable resin composition has relatively low in Bx and is high in intensity in an xy chromaticity diagram of an XYZ color system. A color filter may be formed from the blue curable resin composition. The blue curable composition may be also used in a display device.
ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD
The present disclosure provides an on-press development type lithographic printing plate precursor having a support, an image-recording layer, and an outermost layer in this order, in which a contact angle of a water droplet on a surface of the outermost layer that is measured 2 seconds after the water droplet is landed by an airborne water droplet method is greater than 36°. The present disclosure also provides applications of the on-press development type lithographic printing plate precursor.
Lithographic printing plate precursor
A lithographic printing plate precursor is disclosed including a coating comprising a polymerisable compound, an infrared absorbing dye, a photoinitiator including a trihaloalkyl group and a borate compound.
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
A chemically amplified resist composition comprising (A) a polymer adapted to increase its solubility in alkaline aqueous solution under the action of acid, (B) a photoacid generator capable of generating an acid upon exposure to KrF excimer laser, ArF excimer laser, EB or EUV, and (C) a quencher in the form of an amine compound of specific structure is provided. The resist composition has a high sensitivity and forms a pattern with a high resolution and improved LWR or CDU, independent of whether it is of positive or negative tone.
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
A radiation-sensitive resin composition includes: an onium salt compound represented by formula (1′); a resin including a structural unit having an acid-dissociable group; and a solvent. E.sup.A is a substituted or unsubstituted (α+β)-valent organic group having 1 to 40 carbon atoms; Z.sup.+ is a monovalent radiation-sensitive onium cation; and α and β are each independently 1 or 2.
##STR00001##
NOVEL DIAROYL CARBAZOLE COMPOUND AND USE THEREOF AS SENSITISING AGENT
Provided in the present invention is a novel diaroyl carbazole compound, used together with a carbazolyl oxime ester photo initiator to show a significant synergistic initiation effect in a photoresist composition; the best sensitising effect is shown when the molar ratio of the diaroyl carbazole compound and the carbazolyl oxime ester photoinitiator is 0.1-1.4