A device manufacturing method including: performing a first exposure on a substrate using a first lithographic apparatus to form a first patterned layer including first features; processing the substrate to transfer the first features into the substrate; and performing a second exposure on the substrate using a second lithographic apparatus to form a second patterned layer including second features, wherein: the first lithographic apparatus has first and second control inputs effective to control first and second parameters of the first features at least partly independently; the second lithographic apparatus has a third control input effective to control the first and second parameters of the second features together; and the first exposure is performed with the first and/or second control input set to pre-bias the first and/or second parameter.

A photopolymerisable relief precursor includes a dimensionally stable carrier, and a photopolymerisable relief-forming layer at least containing a crosslinkable elastomeric binder, an ethylenically unsaturated monomer, a migration-capable, surface-active additive, a photoinitiator activatable with UVA light and a photoinitiator activatable with UVC light. A method for producing a relief structure.

A patterning method includes forming a multilayer photoresist stack on a substrate. The multilayer photoresist stack includes a first layer of a wet photoresist, deposited by spin-on deposition, over a second layer of a dry photoresist, deposited by vapor deposition. The multilayer photoresist stack is exposed to a first pattern of actinic radiation including relative, spatially-varying doses of actinic radiation and including high-dose regions, mid-dose regions and low-dose regions. The multilayer photoresist stack and the first pattern of actinic radiation are configured such that after the exposing the multilayer photoresist stack to the first pattern of actinic radiation, in the high-dose regions, developability of both the first layer and the second layer is changed; in the mid-dose regions, developability of the first layer is changed while developability of the second layer is unchanged; in the low-dose regions, developability of both the first layer and the second layer is unchanged.

A coloring composition is a coloring composition including a black colorant, a polymerizable compound, and a photopolymerization initiator, in which the photopolymerization initiator includes a photopolymerization initiator a in which a light absorption coefficient at 365 nm in methanol is more than 1.0×10.sup.2 mL/gcm and a photopolymerization initiator b in which a light absorption coefficient at 365 nm in methanol is 1.0×10.sup.2 mL/gcm or less and a light absorption coefficient at 254 nm is 1.0×10.sup.3 mL/gcm or more, a content of the photopolymerization initiator b is 45.0 to 200.0 parts by mass with respect to 100.0 parts by mass of a content of the photopolymerization initiator a, and a ratio of a maximum absorbance to a minimum absorbance of a coloring cured film obtained by curing the coloring composition at a wavelength of 400 to 700 nm is 1.0 to 2.5.

The present disclosure provides a method for defining multiple resist patterns. In the present disclosure, by using a double-exposing process in combination with a dual-developing process (i.e., a PTD process followed by an NTD process), different resist patterns (e.g., a groove pattern and a through hole pattern) can be formed on a same resist layer. Problems encountered in the prior art, such as insufficient DOF, formation of abnormal patterns, self-alignment issue, overlying problem, and so on, can be successfully addressed.

A method for making a negative-working lithographic printing plate includes subjecting an image-wise exposed, developed, and dried plate precursor to UV LED radiation.

Disclosed herein are systems, methods, and software managing the deployment of development environments for an organization. In one example, a computing system may identify a request for a development environment. In response to the request, the computing system may select one or more images for the development environment from a plurality of images based on an identifier associated with the request and initiate one or more virtual nodes from the one or more images based on a configuration associated with the identifier.

To provide a photosensitive composition capable of easily forming a cured film having a low refractive index. The present invention provides a photosensitive siloxane composition comprising: a polysiloxane, a photosensitive agent, hollow silica particles, and a solvent. The hollow silica particles contain voids inside, and have outer surfaces subjected to hydrophobic treatment.

A screen plate and a manufacturing method of the screen plate, provided for solving a problem of glass cement being thicker at the center and thinner at the border during printing glass cement by use of the screen plate in the prior arts and an inclination of burr generated at the borders. In the screen plate, a pattern layer comprises a plurality of openings, each of which comprises at least two sub-openings which have horizontal dimensions gradually decreasing in a vertical direction from a side close to the screen to a side away from the screen, so that a blade can squeeze the glass cement through a region of the screen corresponding to the sub-opening closest to the screen and further squeeze the glass cement through the plurality of the sub-openings having gradually reduced horizontal dimensions, thereby achieving a uniform output amount of the glass cement at the sub-opening farthest from the screen and eliminating the burr at the border of the printed pattern of the glass cement.

A method for critical dimension control in which a substrate is received having an underlying layer and a radiation-sensitive material layer thereon. The radiation-sensitive material is exposed through a patterned mask to a first wavelength of light in the UV spectrum, and developed a first time. The radiation-sensitive material is flood exposed to a second wavelength of light different from the first wavelength of light and developed a second time to form a pattern. Prior to flood exposure, the radiation-sensitive material has a first light wavelength activation threshold that controls generation of acid to a first acid concentration in the radiation-sensitive material layer and controls generation of photosensitizer molecules in the radiation-sensitive material layer, and a second light wavelength activation threshold different than the first light wavelength activation threshold that can excite the photosensitizer molecules resulting in the acid comprising a second acid concentration greater than the first acid concentration.