In embodiments of a digital lithography system, physical design data prepared at a data prep server in a hierarchical data structure. A leaf node comprises a repeater nod, comprising a bitmap image and a plurality of locations at which the bitmap appears in a physical design. At an EYE server, a repeater node bitmap is adjusted based upon, for example, spatial light modulator rotational adjustment and substrate distortion. The adjusted repeater node and the plurality of locations in which the adjusted repeater appears is compared to the repeater of the data prep server and its plurality of locations. In further embodiments, a rasterizer generates a checksum of bitmap to be printed to a substrate, from the EYE server bitmap. The checksum is compared to a checksum of the EYE server bitmap.

According to an exemplary embodiment of the invention, a method of patterning a photoresist is provided. The method includes selectively illuminating an edge portion of a photoresist using an illumination system to form a patterned portion of the photoresist.

An exposure device includes a rotation driving section that rotationally drives an exposure object; a light irradiation section that irradiates an exposure surface of the exposure object with laser light; a slide moving section secured to the rotation driving section or the light irradiation section, and moving the rotation driving section or the light irradiation section along the exposure surface in a direction crossing a direction of rotation of the rotation driving section; a signal generating section that transmits an analog modulating signal to the light irradiation section in accordance with a rotation synchronization signal from the rotation driving section, the analog modulating signal causing an intensity of the laser light to be changed; and a controlling section that controls movements of the rotation driving section, the slide moving section, and the light irradiation section.

A method for the exposure of image points of a photosensitive layer comprising a photosensitive material on a substrate by means of an optical system. The method including continuously moving the image points with respect to the optical system; and controlling a plurality of secondary beams by means of the optical system individually for individual exposures of each image point, whereby the secondary beams are put either into an ON state or into an OFF state, wherein a) secondary beams in the ON state produce an individual exposure of the image point assigned to the respective secondary beam and b) secondary beams in the OFF state do not produce any individual exposure of the image point assigned to the respective secondary beam; wherein, for the generation of image points with grey tones n>1, individual exposures are carried out by different secondary beams with individual doses D.

This disclosure provides a lithography apparatus including: a lens barrel having an optical system configured to irradiate a substrate with a beam; and a stage apparatus configured to repeat a long distance movement in a primary scanning direction of the substrate and a short distance movement which is shorter than the long distance movement in terms of the amount of movement in a secondary scanning direction of the substrate, and being configured to form a pattern on the substrate with the beam, wherein the stage apparatus includes: a first moving body configured to move in the primary scanning direction; a floating unit configured to support the first moving body, so as to float by a magnetic force and be movable in the primary scanning direction; a second moving body configured to move in the secondary scanning direction; and a guide using a rolling body configured to support the second moving body in contact therewith so as to be movable in the secondary scanning direction.

Maskless lithographic apparatus measuring accumulated amount of light is provided. The maskless lithographic apparatus includes a light source which emits light, a stage on which a substrate is disposed, an optical system which converts the light into a beam spot array including a plurality of columns and a plurality of rows and irradiates the beam spot array onto the stage, a slit to which the beam spot array is irradiated and which passes an nth (n is a natural number) row of the beam spot array, an optical sensor which senses the nth row of the beam spot array which has passed through the slit, and a measuring unit which measures an accumulated amount of light in the nth row of the beam spot array sensed by the optical sensor

The disclosed technology teaches a method of reducing the impact of cross-talk between transducers that drive an acousto-optic modulator. The method includes operating the transducers, which are mechanically coupled to an acousto-optic modulator medium, with different frequencies applied to adjoining transducers and producing a time-varying phase relationship between carriers on spatially adjoining modulation channels emanating from the adjoining transducers, with a frequency separation between carriers on the adjoining channels of 400 KHz to 20 MHz. The disclosed technology also includes operating 5 to 32 modulators, which are mechanically coupled to the acousto-optic modulator crystal, and varying the different frequencies applied to the modulators in a sawtooth pattern, varying the different frequencies over a range and then repeating variation over the range. Also included is varying the frequencies applied to the modulators in a rising or falling pattern applied progressively to the spatially adjoining transducers.

A method for processing print data defining a pattern to be printed comprises obtaining (S10) of vector print data for the pattern to be printed. The vector print data is divided (S12) into vector print data of scan strips, wherein each scan strip is associated with a scan velocity. A skew transformation of the vector print data is performed (S14) in each scan strip. The skew transformation is performed in a direction opposite to respective scan velocity and with a magnitude proportional to a magnitude of the scan velocity. A method for printing a pattern, a device for processing print data and a printing device according to the same principles are also disclosed.

A drawing method for drawing a wiring pattern on a substrate is provided. The wiring pattern includes first regions, in which a pattern in the width direction of the substrate changes in the longitudinal direction of that, and second regions, in which a pattern in the width direction does not change in the longitudinal direction. The drawing data includes two-dimensional image data representing a two-dimensional pattern of the first regions, one-dimensional image data representing a one-dimensional pattern in the width direction of the second regions, and information representing lengths of the second regions. The method includes: drawing the pattern of the first regions by scanning the beam based on the two-dimensional image data and conveying the substrate; and drawing the pattern of the second regions by irradiating the substrate with the beam based on the one-dimensional image data and conveying the substrate based on the information representing lengths.

A freeform metrology information acquisition system is disclosed. The system includes a measurement probe, one or more cameras, and a computing device. The measurement probe is configured to obtain metrology information for an object under inspection. The camera(s) are configured to image a scene including the measurement probe and the object under inspection. The computing device is configured to receive the metrology information from the measurement probe, receive one or more images from the one or more cameras, determine a position of the measurement probe in the scene based at least on the one or more images, spatially registering the metrology information acquired by the measurement probe to one or more determined positions of the measurement probe in the scene, and visually present, via a display, a visual representation of the metrology information spatially registered to the one or more determined positions of the measurement probe in the scene.