An electronic circuit includes a first electronic component formed above a buried insulating layer of a substrate and a second electronic component formed under the buried insulating layer. The insulating layer is thoroughly crossed by a semiconductor well. The semiconductor well electrically couples a terminal of the first electronic component to a terminal of the second electronic component.

An electrostatic discharge protection circuit includes a pull-down switch, a dummy pattern arranged parallel to the pull-down switch in a first direction, clamp switches arranged parallel to each other in the first direction between the dummy pattern and the pull-down switch, and a resistor configured to transfer a power supply voltage supplied through a power terminal to a gate pattern of the pull-down switch by being arranged parallel to the pull-down switch. Drains of the clamp switches are coupled in common to the power terminal, sources of the clamp switches are coupled in common to a ground terminal, and a first end of the pull-down switch and a second end of the resistor are coupled to each other through a first conductive line extending in the first direction, the pull-down switch, the resistor and the first conductive line are formed in a same layer.

A semiconductor device including a first transistor and a second transistor. The first transistor has a first body. The first body of the first transistor is connected to receive a first reference voltage. The second transistor has a second body. The second body of the second transistor is electrically disconnected from the first body of the first transistor. The first transistor and the second transistor are electrically connected in series.

In an integrated circuit supporting complementary metal oxide semiconductor (CMOS) integrated circuits, latch-up immunity is supported by surrounding a hot n-well with an n-well strap spaced from the hot n-well by a specified distance in accordance with design rules. The n-well strap is positioned between the hot n-well and other n-well or n-type diffusion structures.

This application relates to a charging protection circuit. The charging protection circuit implements overcurrent protection by using a four-terminal NMOS switching transistor. In the solution provided in this application, floating management is performed on a Sub port of the four-terminal NMOS switching transistor. Specifically, when the four-terminal NMOS switching transistor is turned on, potential of the Sub port is pulled up, to avoid an excessively large internal resistance of the four-terminal NMOS switching transistor caused by an excessively large voltage between the Sub port and a drain of the four-terminal NMOS switching transistor. In addition, this application further provides a charging circuit and an electronic device.

An electronic circuit includes a first electronic component formed above a buried insulating layer of a substrate and a second electronic component formed under the buried insulating layer. The insulating layer is thoroughly crossed by a semiconductor well. The semiconductor well electrically couples a terminal of the first electronic component to a terminal of the second electronic component.

A layout structure of an ESD protection semiconductor device includes a substrate, a first doped region, a pair of second doped regions, a pair of third doped regions, at least a first gate structure formed within the first doped region, and a drain region and a first source region formed at two sides of the first gate structure. The substrate, the first doped region and the third doped regions include a first conductivity type. The second doped regions, the drain region and the first source region include a second conductivity type complementary to the first conductivity type. The first doped region includes a pair of lateral portions and a pair of vertical portions. The pair of second doped regions is formed under the pair of lateral portions, and the pair of third doped regions is formed under the pair of vertical portions.

An enhanced ESD clamp is provided with a resistor connected between the body terminal and the source terminal of a MOSFET device. In one exemplary embodiment, the MOSFET device is a grounded-gate NMOS (ggNMOS) transistor device with the resistor (“body resistor”) connected externally to the MOSFET device. In another embodiment, the MOSFET device is a ggPMOS transistor device. In yet another embodiment, the body resistor is disposed within and connected internally to the MOSFET device. In any event, the resistance value of the body resistor determines the level to which the trigger voltage of the ESD clamp will be reduced when an ESD event occurs.

An ESD protection apparatus includes a semiconductor substrate, a first gate structure, a first doping region, a second doping region and a third doping region. The semiconductor substrate has a doping well with a first conductivity one end of which is grounded. The first gate structure is disposed on the doping well. The first doping region having a second conductivity, is disposed in the doping well and adjacent to the first gate structure, and is electrically connected to a pad. The second doping region having the second conductivity is disposed in the doping well and adjacent to the first gate structure. The third doping region having the first conductivity is disposed in the doping well and forms a P/N junction interface with the second doping region, wherein the second doping region and the third doping region respectively have a doping concentration substantially greater than that of the doping well.

A MOSFET and an electrostatic discharge (ESD) protection device on a common chip includes a MOSFET with a source, a gate, and a drain, and an ESD protection device configured to implement a diode function that is biased to prevent current from flowing through the common chip from the source to the drain.