An on-chip clock controller includes a primary clock gating cell and a secondary clock gating cell. The primary clock gating cell includes a first clock input terminal coupled to receive an input clock signal and a first enable input terminal coupled to receive an enable signal. The primary clock gating cell also include a first clock output terminal configured to generate a first output clock signal based at least in part on the input clock signal and the enable signal. The secondary clock gating includes a second clock input terminal coupled to receive the input clock signal and a second clock output terminal configured to generate a second output clock signal based at least in part on the input clock signal. The enable signal is based at least in part on the second output clock signal.

An on-chip clock controller includes a primary clock gating cell and a secondary clock gating cell. The primary clock gating cell includes a first clock input terminal coupled to receive an input clock signal and a first enable input terminal coupled to receive an enable signal. The primary clock gating cell also include a first clock output terminal configured to generate a first output clock signal based at least in part on the input clock signal and the enable signal. The secondary clock gating includes a second clock input terminal coupled to receive the input clock signal and a second clock output terminal configured to generate a second output clock signal based at least in part on the input clock signal. The enable signal is based at least in part on the second output clock signal.

Systems, methods and apparatus for regulating ion energies in a plasma chamber and avoiding excessive and damaging charge buildup on the substrate surface and within capacitive structures being built on the surface. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis, and to maintain surface charge buildup below a threshold.

A system and method is provided including a first pulse width modulation (PWM) generator circuit including a first timer to generate a first cycle count, a first configuration register to define characteristics of a first electrical pulse to be generated, and a trigger cycle count specifying a timing of a first trigger signal, and a first load enable input to load a new configuration value into the first configuration register, a second PWM generator circuit including a second timer to generate a second cycle count, a second configuration register to define characteristics of a second electrical pulse to be generated, a second load enable input to load a new configuration value into the second configuration register, and a load enable selector to selectively drive the second load enable input based on the first trigger signal.

A system and method is provided including a first pulse width modulation (PWM) generator circuit including a first timer to generate a first cycle count, a first configuration register to define characteristics of a first electrical pulse to be generated, and a trigger cycle count specifying a timing of a first trigger signal, and a first load enable input to load a new configuration value into the first configuration register, a second PWM generator circuit including a second timer to generate a second cycle count, a second configuration register to define characteristics of a second electrical pulse to be generated, a second load enable input to load a new configuration value into the second configuration register, and a load enable selector to selectively drive the second load enable input based on the first trigger signal.

Systems, methods and apparatus for regulating ion energies in a plasma chamber and avoiding excessive and damaging charge buildup on the substrate surface and within capacitive structures being built on the surface. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis, and to maintain surface charge buildup below a threshold.

Systems, methods and apparatus for regulating ion energies in a plasma chamber and avoiding excessive and damaging charge buildup on the substrate surface and within capacitive structures being built on the surface. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis, and to maintain surface charge buildup below a threshold.

Systems, methods and apparatus for regulating ion energies in a plasma chamber and avoiding excessive and damaging charge buildup on the substrate surface and within capacitive structures being built on the surface. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis, and to maintain surface charge buildup below a threshold.

Systems, methods and apparatus for regulating ion energies in a plasma chamber and avoiding excessive and damaging charge buildup on the substrate surface and within capacitive structures being built on the surface. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis, and to maintain surface charge buildup below a threshold.

A system and method is provided including a first pulse width modulation (PWM) generator circuit including a first timer to generate a first cycle count, a first configuration register to define characteristics of a first electrical pulse to be generated, and a trigger cycle count specifying a timing of a first trigger signal, and a first load enable input to load a new configuration value into the first configuration register, a second PWM generator circuit including a second timer to generate a second cycle count, a second configuration register to define characteristics of a second electrical pulse to be generated, a second load enable input to load a new configuration value into the second configuration register, and a load enable selector to selectively drive the second load enable input based on the first trigger signal.