The high-frequency treatment device according to one embodiment of the present disclosure includes: a heating chamber that accommodates a heating target; an oscillator; at least one feeder; a detector; and a controller. The oscillator generates high-frequency power having an arbitrary frequency in a predetermined frequency band. At least one feeder supplies incident microwave power based on the high-frequency power to the heating chamber. The detector detects the incident microwave power and reflected microwave power returning from the heating chamber to at least one feeder. The controller causes the oscillator to execute a frequency sweep and measures a reflection characteristic based on the incident microwave power and the reflected microwave power for each heating condition including a frequency. The controller determines, based on a reflection variation range indicating a change in the reflection characteristic for each heating condition, a heating condition to be used next. According to the present aspect, various heating targets can be optimally heated.

The present disclosure is to provide a method for providing customized cooking content and a user terminal for implementing the same that may increase a quality of the dish and interest in cooking by allowing a user to cook at a pace that suits a user's level in consideration of cooking skills of the user, and may provide an environment more suitable for cooking in association with a near kitchen tool and/or home appliance. Provided is a user terminal including a display, a camera, and a controller for performing control to recognize information about a cooking process appearing in cooking content via artificial intelligence, recognize, via the artificial intelligence, a cooking situation of a user filmed via the camera during reproduction of the cooking content, and adjust a reproduction speed of the cooking content based on the cooking process of the cooking content and the cooking situation of the user.

Aspects include a system that allows a microwave oven to intelligently self-choose the optimal cooking time for various items to prevent over/under cooking as well as overcoming cooking inconsistencies that are inherent in non-intelligent microwave ovens. Cooking time optimizations can be performed by controlling radio-frequency emission, cooking time, and/or rotation or movement of a turntable or platter within a microwave cavity of a microwave oven to more evenly heat the contents therein.

An automated microwave oven configured to autonomously determine a duration of time for heating an object based on a location of the object in a microwave cavity. The heating duration may be a function of cumulative energy estimated to be experienced by the object due to the object location, e.g., radial distance from center, under rotational motion of the rotating tray. A concentric energy visualization is provided on an interior surface of the microwave cavity, representing a function of cumulative energy experienced under rotational motion of a rotating tray about its center-line. The visualization may comprise a plurality of rings concentric about the center-line, each concentric ring representing a constant value of the function of cumulative energy, oscillating in value along the radial length of the rotating tray.

A substrate processing technology including: transferring a substrate to a process chamber and mounting the substrate on a substrate holder; heating the substrate with a heating device to perform predetermined substrate processing; determining the number of times of the predetermined substrate processing that has been performed that the predetermined substrate processing has been performed a preset number of times or more, determining whether it is necessary to adjust a mounting position at which the substrate is mounted on the substrate holder; and when it is determined that a mounting position adjustment is necessary, determining the mounting position by comparing the substrate temperature measured at the performing the predetermined substrate processing with a premeasured temperature of the substrate which corresponds to the mounting position and is stored in a memory.

A fast annealing equipment is applicable to the annealing treatment of silicon carbide wafers. The fast annealing equipment comprises a variable frequency microwave power source system, a resonant chamber heating system and a measurement and control system. The variable frequency microwave power source system uses a solid state power amplifier and has the flexibility of fast frequency sweep during heat treatment to compensate for resonant frequency changes due to load effect caused by temperature changes in a material to be annealed. In order to improve an energy efficiency and provide a sufficient microwave energy uniform area, the TM.sub.010 resonant chamber structure can be used to anneal 4-inch to 8-inch silicon carbide wafers. The measurement and control system combines software and hardware to form an automatic system with instant feedback to provide further flexibility, stability and reliability for the entire equipment.

A heating cooker includes a heating chamber, an imaging device, a heating device, and control device (300). Control device (300) includes captured image acquisition unit (302), heating information acquisition unit (303), heating controller (307), and state detector (304). Captured image acquisition unit (302) acquires an image captured by the imaging device. Heating information acquisition unit (303) acquires heating information by referring to the image of a heating target acquired. Heating controller (307) controls the heating device according to the heating information. State detector (304) detects presence or absence of the heating target in the heating chamber or removal of the heating target from the heating chamber by referring to the image captured. Heating information acquisition unit (303) acquires the heating information when state detector (304) detects absence of the heating target in the heating chamber or removal of the heating target from the heating chamber.

The present invention relates to a thawing-apparatus, in which a substance is preferably heated. The present invention further relates to a method to thaw a substance with radio-frequency waves.

A heating cooker according to the present disclosure includes a heating chamber, a heating unit, a capturing unit, a control unit, an appearance characteristic analysis unit that analyzes an appearance characteristic of a heated material, an information reading unit that reads heating control information, an information storage unit in which an acceptable range of the heating control information is registered, and an information determination unit that determines whether the heating control information read by the information reading unit is within the acceptable range. When the heating control information read by the information reading unit is within the acceptable range, the control unit executes heating control based on the heating control information read by the information reading unit. When the heating control information read by the information reading unit is not within the acceptable range, the control unit does not execute heating control based on the heating control information read by the information reading unit.

A method by an electromagnetic device includes determining a pattern of electromagnetic energy absorbed by a load disposed inside a cavity into which electromagnetic radiation is directed and generating one or more maps of the pattern of electromagnetic energy absorbed by the load. The one or more maps comprises an indication of a distribution of heating within the load. The method further includes determining, based on the one or more maps, a plurality of sequences of operating parameter combinations configured so as to heat the load via absorption of the electromagnetic radiation in accordance with a target temperature profile with respect to the load. The method thus includes emitting electromagnetic radiation into the cavity based on the plurality of sequences of operating parameter combinations to achieve the target temperature profile with respect to the load.