An electrical device comprising a reconfigurable integrated circuit that includes paired top electrodes and bottom electrodes separated from each other by an active layer.

A memory cell includes a memory device, a connecting structure, an insulating layer and a selector. The connecting structure is disposed on and electrically connected to the memory device. The insulating layer covers the memory device and the connecting structure. The selector is located on and electrically connected to the memory device, where the selector is disposed on the insulating layer and connected to the connecting structure by penetrating through the insulating layer.

An electronic device comprising a semiconductor memory including at least one memory element is provided. The memory element comprises: a memory area for storing data; and a selection element electrically connected to the memory area and structured to include a first electrode layer, a second electrode layer, and a selection element layer that is interposed between the first electrode layer and the second electrode layer and includes an insulating material doped with a first dopant and a second dopant to form traps for trapping charge carriers, wherein an energy level of a trap formed by the first dopant is greater than an energy level of a trap formed by the second dopant.

A semiconductor device is provided. The semiconductor device includes a substrate a substrate, a first electrode structure on the substrate, the first electrode structure including first insulating patterns and first electrode patterns, the first insulating patterns alternately stacked with the first electrode patterns, a second electrode pattern on a sidewall of the first electrode structure, and a data storage film on a sidewall of the second electrode pattern. The data storage film has a variable resistance.

An electrolyte-based field effect transistor includes a dielectric layer; a source electrode and a drain electrode located on top of the dielectric layer; the electrolyte-based transistor further including an electrolyte layer between and on top of the source electrode and the drain electrode, the part of the electrolyte layer located between the source electrode and the drain electrode being in direct contact with the dielectric layer; and a gate electrode on top of the electrolyte layer, the orthogonal projection of the gate electrode in a plane including the source and drain electrodes being located, at least in part, between the source and the drain electrodes.

Embodiments provide a selector device for selecting a memory cell. The selector device includes a first electrode; a second electrode; and a switching layer sandwiched between the first electrode and the second electrode. The switching layer includes at least one metal rich layer and at least one chalcogenide rich layer. The metal rich layer includes at least one of a metal or a metal compound, wherein metal content of the metal rich layer is greater than 50 at. %. The chalcogenide content of the chalcogenide rich layer is greater than 50 at. %.

A method of manufacturing an electronic device comprises: forming a plurality of line patterns on a substrate extending in a first direction and including a first conductive line and a memory pattern; forming a first liner layer on sidewalls of each of the plurality of line patterns, the first liner layer including a plurality of layers having different energy band gaps; forming an insulating interlayer on the substrate; forming a plurality of second conductive lines on the line patterns and the insulating interlayer; etching the first liner layer, the insulating interlayer and the memory pattern using the second conductive lines as an etch barrier to expose the first conductive line to form a plurality of memory cells; and forming a second liner layer on both sidewalls of each of the memory cells, the etched first liner layer and both sidewalls of the etched insulating interlayer.

Stochastic or near-stochastic physical characteristics of resistive switching devices are utilized for generating data distinct to those resistive switching devices. The distinct data can be utilized for applications related to electronic identification. As one example, data generated from physical characteristics of resistive switching devices on a semiconductor chip can be utilized to form a distinct identifier sequence for that semiconductor chip, utilized for verification applications for communications with the semiconductor chip or utilized for generating cryptographic keys or the like for cryptographic applications.

The present invention discloses a method for manufacturing a phase change memory and a phase change memory. The method comprises: forming a first wafer having a semiconductor-on-insulator structure; forming a memory material layer on the semiconductor-on-insulator structure; and forming a first metal material layer on the memory material layer to form a first semiconductor element.

A filament type non-volatile memory device, includes a first electrode, a second electrode and an active layer extending between the first electrode and the second electrode, the active layer electrically interconnecting the first electrode to the second electrode, the device being suitable for having: a low resistive state, in which a conducting filament electrically interconnecting the first electrode to the second electrode uninterruptedly extends from end to end through the active layer, the filament having a low electric resistance, and a highly resistive state, in which the filament is broken, the filament having a high electric resistance. The device further includes a shunt resistance electrically connected in parallel to the active layer, between the first electrode and the second electrode.