EMBEDDED ORGANIC INTERPOSER FOR HIGH BANDWIDTH
20260083016 ยท 2026-03-19
Inventors
Cpc classification
H05K1/0243
ELECTRICITY
H05K1/185
ELECTRICITY
H05K2201/09227
ELECTRICITY
International classification
H01L25/065
ELECTRICITY
H01L23/498
ELECTRICITY
H01L23/538
ELECTRICITY
H01L25/00
ELECTRICITY
H01L25/16
ELECTRICITY
Abstract
Embedded organic interposers for high bandwidth are provided. Example embedded organic interposers provide thick conductors with more dielectric space, and more routing layers of such conductors than conventional interposers, in order to provide high bandwidth transmission capacity over longer spans. The embedded organic interposers provide high bandwidth transmission paths between components such as HBM, HBM2, and HBM3 memory stacks, and other components. To provide the thick conductors and more routing layers for greater transmission capacity, extra space is achieved by embedding the organic interposers in the core of the package. Example embedded organic interposers lower a resistive-capacitive (RC) load of the routing layers to provide an improved data transfer rate of 1 gigabits per second over at least a 6 mm span, for example. The embedded interposers are not limited to use with memory modules.
Claims
1-20. (canceled)
21. A microelectronic apparatus, comprising: a substrate comprising at least one core layer, the at least one core layer comprising an inorganic material; an interposer for electrically connecting microelectronic components, the interposer comprising: a plurality of parallel organic dielectric layers; and a plurality of routing layers, each of the routing layers disposed between adjacent ones of the organic dielectric layers, each of the routing layers comprising horizontal traces, wherein: the interposer is embedded in the at least one core layer, the at least one core layer and the interposer defining a horizontal substrate surface that is parallel to the horizontal traces; and each of the horizontal traces comprises a conductor having a cross-sectional thickness within a range of 1-7 microns and a cross-sectional width within a range of 2-10 microns; and a build-up layer disposed vertically adjacent to the horizontal substrate surface, wherein the build-up layer comprises conductors for connecting microelectronic components to the horizontal traces.
22. The microelectronic apparatus of claim 21, wherein each routing layer of the plurality of routing layers comprises a line/space pitch that is at least five times a pitch of a pinout density of at least one microelectronic component of the microelectronic components.
23. The microelectronic apparatus of claim 21, wherein the cross-sectional width and the cross-sectional thickness are per a length within a range of 5-16 mm of each routing layer.
24. The microelectronic apparatus of claim 21, wherein each of the routing layers comprising horizontal traces has a tracing space within a range of 2-10 microns.
25. The microelectronic apparatus of claim 21, wherein each of the routing layers comprising horizontal traces has a tracing space of at least 3 microns.
26. The microelectronic apparatus of claim 21, wherein the horizontal traces and the conductors connect two or more microelectronic components disposed on the build-up layer.
27. The microelectronic apparatus of claim 21, wherein the organic dielectric layers comprise an organic polymer.
28. The microelectronic apparatus of claim 21, wherein the organic dielectric layers comprise an epoxy or a glass-reinforced epoxy laminate.
29. The microelectronic apparatus of claim 21, wherein the organic dielectric layers comprise a bismaleimide-triazine resin.
30. The microelectronic apparatus of claim 21, wherein one or more semiconductor cores are embedded in the interposer.
31. The microelectronic apparatus of claim 21, wherein at least one chip capacitor is embedded in the core layer.
32. The microelectronic apparatus of claim 21, wherein at least one chip capacitor is embedded in the interposer.
33. The microelectronic apparatus of claim 21, wherein the microelectronic components are memory stacks.
34. A microelectronic apparatus, comprising: a substrate comprising at least one core layer, the at least one core layer comprising an inorganic material; an interposer for electrically connecting microelectronic components, the interposer comprising: a plurality of parallel organic dielectric layers; and a plurality of routing layers, each of the routing layers disposed between adjacent ones of the organic dielectric layers, each of the routing layers comprising horizontal traces, wherein: the interposer is embedded in the at least one core layer, the at least one core layer and the interposer defining a horizontal substrate surface that is parallel to the horizontal traces; each of the horizontal traces comprises a conductor having a cross-sectional width within a range of 2-10 microns; and each of the routing layers comprising horizontal traces has a tracing space within a range of 2-10 microns; and a build-up layer disposed vertically adjacent to the horizontal substrate surface, wherein the build-up layer comprises conductors for connecting microelectronic components to the horizontal traces.
35. The microelectronic apparatus of claim 34, wherein each routing layer of the plurality of routing layers comprises a line/space pitch that is at least five times a pitch of a pinout density of at least one microelectronic component of the microelectronic components.
36. The microelectronic apparatus of claim 34, wherein: each of the horizontal traces further comprises the conductor having a cross-sectional thickness within a range of 1-7 microns; and the cross-sectional width and the cross-sectional thickness are per a length within a range of 5-16 mm of each routing layer.
37. A microelectronic apparatus, comprising: a substrate comprising at least one core layer, the at least one core layer comprising an inorganic material; an interposer for electrically connecting microelectronic components, the interposer comprising: a plurality of parallel organic dielectric layers; and a plurality of routing layers, each of the routing layers disposed between adjacent ones of the organic dielectric layers, each of the routing layers comprising horizontal traces, wherein the interposer is embedded in the at least one core layer, the at least one core layer and the interposer defining a horizontal substrate surface that is parallel to the horizontal traces; and a build-up layer disposed vertically adjacent to the horizontal substrate surface, wherein the build-up layer comprises conductors for connecting microelectronic components to the horizontal traces.
38. The microelectronic apparatus of claim 37, wherein each of the horizontal traces comprises a conductor having a cross-sectional thickness within a range of 1-7 microns.
39. The microelectronic apparatus of claim 37, wherein each of the horizontal traces comprises a conductor having a cross-sectional width within a range of 2-10 microns.
40. The microelectronic apparatus of claim 37, wherein each of the routing layers comprising horizontal traces has a tracing space within a range of 2-10 microns.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0009] Certain embodiments of the disclosure will hereafter be described with reference to the accompanying drawings, wherein like reference numerals denote like elements. It should be understood, however, that the accompanying figures illustrate the various implementations described herein and are not meant to limit the scope of various technologies described herein.
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DETAILED DESCRIPTION
Overview
[0022] This disclosure describes example embedded organic interposers providing high bandwidth. An example embedded organic interposer includes larger conductors, and more routing layers of such larger conductors, than in conventional interposers. Example embedded organic interposers can also provide more dielectric spacing between conductors, to provide higher bandwidth data pipes than conventional interposers of various types. Each embedded organic interposer aims to provide a high capacity, high bandwidth data path between high bandwidth components, such as high bandwidth memory stacks (HBM, HBM2, HBM3, etc.) and associated components, such as application specific integrated circuit (ASIC) chips of a memory module, memory controllers, and so forth. The embedded organic interposers can be used in numerous types of microelectronic packages.
Example Systems
[0023] The example embedded organic interposers provide thicker conductors. To achieve such thick conductors, and also to achieve more routing layers for greater transmission capacity, the extra space needed is achieved by embedding the organic interposers in the core of the package. The extra space also allows thicker dielectric material around conductors, for even greater transmission benefit. This extra transmission capacity and more routing layers, each consisting of thicker conductors, cannot be achieved just by conventional routing layers that are situated conventionally above the core. The example embedded organic interposers lower a resistive-capacitive (RC) load of the routing layers to provide improved signal transmission of up to 20-60 GHz for each 15 mm length of each organic interposer. The embedded organic interposers described herein are not limited to memory modules, but memory is used as an example for the sake of description.
[0024] Each example embedded organic interposer can be a separate insert or inlay in a core layer, for example, of a microelectronics package. An embedded organic interposer is inserted, formed, inlaid, or encased (all of these encompassed by the term embedded) into a space, cavity, indent, or hole in a core layer of a microelectronics package. By contrast, the single monolithic layer (e.g., of silicon) that constitutes conventional interposers, or conventional bridge interposers residing above the core layer, are situated above the core or only in the build-up layers of the microelectronics package above the core layer.
[0025] An example embedded organic interposer can be constructed of conductors, such as copper, disposed in various materials, such as high modulus organic materials with low coefficients of thermal expansion (CTE) of around 4 ppm/K CTE, for example. Construction of the example embedded organic interposers can use low cost processes and materials. The organic materials used for example embedded organic interposers can be composites or polymers, an epoxy, glass-reinforced epoxy laminate (e.g., FR4), a bismaleimide-triazine (BT) resin organic material, or other suitable carbon-based or even non-carbon based materials or composites. Thus, organic is used loosely herein to differentiate from silicon and pure glass, and as used herein, organic also means an inexpensive material with suitable dielectric, tensile modulus, density, and CTE qualities to make an embeddable organic interposer as described below.
[0026]
[0027] In
[0028] In another implementation, the core layer 220 of the package, such as the high bandwidth memory module 200 or other microelectronics package, may consist of a ceramic substrate with cavities or impressions formed in the ceramic substrate. The embedded organic interposer 204 may comprise a layer of an organic substrate applied over the ceramic substrate. The organic substrate can be inlaid in the cavities or impressions of the ceramic substrate, alternating with routing layers in an in situ stack construction of the embedded organic interposer 204, built in place. Or, the organic interposer 204 can be inlaid into a cavity of the ceramic substrate as a premade single unit.
[0029] In the example memory module 200, a central component, such as at least one ASIC chip 222 communicates with high bandwidth memory components, such as HBM2 memory stacks 224 & 226 & 228 & 230 & 232 & 234 & 236 & 238 via corresponding embedded organic interposers 204-218. In other types of packages, the central component may be a processor, coprocessor, controller, field-programmable gate array (FPGA), or other integrated circuits or dies. The ASIC chip 222 may also have optional SerDes interfaces onboard. In the example memory module 200, the memory dies of the example HBM2 memory stacks 224 may be 12 mm on a side, and the interface to an embedded organic interposer 204 may be 6 mm wide. Conventionally, this may result in a conventional ASIC with unused beachfront between interface areas on the conventional ASIC. The embedded organic interposers 204-218, however, can allow an ASIC chip 222 to better utilize the borders of the ASIC chip 222, by using most of the beachfront of the ASIC border for connections to the embedded organic interposers 204-218. In other words, the embedded organic interposers 204-218 enable more connections, and more high density connections to more example HBM2 memory stacks 224-238, than allowed by conventional interposers.
[0030] The various chip and stack components may be mounted on one or more build-up layers 240 above the core layers 220, and communicatively coupled with the respective embedded organic interposers 204 through vertical vias 242, wires, pins, pads, solder balls, and so forth mediated by the one or more build-up layers 240. The core layer 220 may also have one or more opposing build-up layers 244 on an opposing side of the core layers 220. The embedded organic interposers 204 may also be used to connect non-control and non-processing components together in parallel or in series in various microelectronics packages.
[0031] The example embedded organic interposers 204 achieve a high bandwidth of data transmission suitable for HBM, HBM2, HBM3, and so forth, by including numerous routing layers in a vertical stack within the embedded organic interposer 204. For example, an embedded organic interposer 204 may provide at least four or more routing layers 246 within the embedded organic interposer 204 itself, above the core layer(s) 220 and above routing layers native to the core layer(s) 220, before the organic interposer 204 is embedded. Moreover, each routing layer 246 preferably has a line/space that is at least five times the pitch of the pinout density of the ASIC 222 or other processor being connected.
[0032] An example high bandwidth memory module 200, constructed as described above, therefore can include at least one core layer 220, an ASIC 222 or logic chip over the core layer 220 or on an intervening build-up layer 240, at least a first row 248 of multiple high bandwidth memory (HBM or HBM2) stacks 232 & 234 adjacent and proximate to the ASIC chip 222 or the logic chip, one or more additional rows 250 of multiple HBM or HBM2 stacks 236 & 238 on a far side of the first row 248 of multiple HBM stacks 232 & 234, the one or more additional rows 250 remote from the ASIC chip 222 or the logic chip and separated from the ASIC chip 222 or the logic chip by the first row 248.
[0033] A first set of embedded organic interposers 214 & 218 are embedded in the core layer(s) 220 and connect to each proximate HBM or HBM2 stack 232 & 234 of the first row 248 of stacks with the ASIC chip 222 or the logic chip. Each embedded organic interposer 232 & 234 of the first set has a first length, for example. A second set of organic interposers 212 & 216 embedded in the core layer(s) 220 underpasses the first row 248 of HBM stacks 232 & 234 and connects a respective remote HBM stack 236 & 238 of the one or more additional rows 250 of stacks with the ASIC chip 222 or the logic chip. Each organic interposer 236 & 238 of the second set has a length longer than the first length of the organic interposers 214 & 218 of the first set. In an implementation, the conductive traces in each organic interposer 212 & 214 & 216 & 218 (and the same for the four organic interposers shown on the other side of the ASIC 22) provide at least four vertically stacked routing layers 246 above a core material or a native routing layer of the core layers 220.
[0034] As introduced above, the example high bandwidth memory module 200 has conductive traces in the organic interposers 204 with an example pitch of at least five times greater than a beachfront pitch of the ASIC chip 222, the logic chip, or of a HBM stack 228 connected to the routing layers 246 of the embedded organic interposer 204. This beachfront pitch is the pinout density of the ASIC chip 222 or logic chip (or the HBM stack 228), for example, as the aggregate trace count traversing an edge of a component, per unit length.
[0035] In an implementation, each embedded organic interposer 204 may have a physical width up to approximately the entire width of a respectively connected HBM (HBM2, HBM3) stack, although
[0036] In an implementation, the conductive traces of the at least four routing layers 246 of each organic interposer 204 are thick enough and/or wide enough to lower a resistive-capacitive (RC) load of the routing layers 246, thereby providing up to 20-60 GHz bandwidth for each 15 mm length of each organic interposer 204.
[0037] In an implementation, each routing layer 246 provides a bandwidth performance of greater than 14 GHz with no worse than 5 dB insertion loss per 15 mm length of the routing layer 246. The example embedded organic interposers 204 provide thicker conductors, with greater cross-sectional dimensions of the metal in the conductive traces of the routing layers 246, and more routing layers 246 than in conventional interposers. A transmission line structure of the at least four routing layers 246 may have a tracing space of at least 3 microns (m) or within a range of 2-10 microns, and dimensions of the conductive traces that include width in the range of 2-10 microns and a thickness in the range of 1-7 microns, per 5-15 mm length of each routing layer 246. The example embedded organic interposers 204 can provide enough conduction capacity to lower the resistive-capacitive (RC) load of the routing layers, providing the high signal transmission bandwidth.
[0038] In other implementations that vary from the examples shown in
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[0042] The example memory module 500 of
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[0046] The shortest embedded organic interposers 706 & 712 connect two rows of HBM2 memory stacks to the ASIC chip 222, a first row that includes HBM2 memory stacks 714 & 716, and a second row that includes HBM2 memory stacks 726 & 728. Longer embedded organic interposers 704 & 710 connect another two rows of HBM2 memory stacks to the ASIC chip 222, a third row that includes HBM2 memory stacks 718 & 720, and a fourth row that includes HBM2 memory stacks 730 & 732. Yet another set of embedded organic interposers 702 & 708 are longer yet, and connect another two rows of HBM2 memory stacks to the ASIC chip 222, a fifth row that includes HBM2 memory stacks 722 & 724, and a sixth row that includes HBM2 memory stacks 734 & 736.
[0047] The example memory module 700 of
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[0049] An example embedded organic interposer, such as interposer 806 may branch along its length. Likewise, an example embedded organic interposer 808 may also branch multiple times along its length. A single embedded organic interposer 806 may couple an entire row 810 of memory stacks 804, or a single embedded organic interposer 808 may couple multiple entire rows of the memory stacks. Thus, an embedded organic interposer, such as interposer 806, may have at least one part that is as wide as a row 810 of memory stacks. The embedded organic interposers 806 & 808 may also contain bends, angles, and other types of branches along their lengths. In general, the embedded organic interposers do not have to be straight or contain only straight conductors.
[0050] Example device 812 has a central logic chip, central ASIC chip, or central control chip 222 with instances of the embedded organic interposers 814 having access to the central control chip 222 on all edges of the chip 222, for example, on all four sides of the central control chip 222. The example high bandwidth embedded organic interposers 814 can underpass components, such as die stacks 816 & 818 to connect to a furthest component or die stack 820.
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[0053] In an implementation, an example embedded organic interposer 1008 may be as wide as interfaces on an ASIC chip 222 or other central chip or controller, and/or as wide as multiple connected components, such as a row 1010 of memory modules.
[0054] In an implementation, example embedded organic interposers 1012 & 1014 may also include bends or angles 1016 & 1018, not only in the x-y plane, but also in the x-z and y-z planes of the given substrate 202 or core 220.
[0055] In an implementation, a given embedded organic interposer 1012 may also underpass or cross under (or over) a different instance of the embedded organic interposer 1022.
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[0057] Each routing layer may have a transmission line structure of the conductive traces with a tracing space of at least 3 microns (m) or within a range of 2-10 microns, and dimensions of the conductive traces comprising a width in the range of 2-10 microns and a thickness in the range of 1-7 microns, per 5-16 mm length of each routing layer.
[0058] In
[0059] The two graphs in
[0060] When the trace dimensions increase from 2 m1 m to 6 m3 m, the insertion loss is reduced by a factor of 3 (3 reduction of insertion loss). When the trace dimensions further increase in turn, from 6 m3 m to 10 m7 m, the insertion loss is reduced by an additional 50%. Thus, when the trace dimensions increase from 2 m1 m to 10 m7 m, the insertion loss is reduced by a factor of 6 (6 reduction of insertion loss).
[0061] Referring to
Example Methods
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[0063] At block 1202, an organic interposer is at least partially embedded in a core layer of a microelectronics package, such as a high bandwidth memory module, to provide at least four routing layers above a core material of the core layer.
[0064] At block 1204, a main or central die or chip, such as an application-specific integrated circuit (ASIC) chip, is mounted above the core layer of the microelectronics package.
[0065] At block 1206, an electronics component, such as a high bandwidth memory stack (HBM, HBM2, HBM3.) is mounted above the core layer of the microelectronics package.
[0066] At block 1208, the main or central chip and the electronics component, for example the ASIC and an HBM2 stack, are coupled via the embedded organic interposer to provide a high bandwidth data path with reduced resistive-capacitive (RC) load, for high bandwidth signal transmission between the main chip and the component, or between the ASIC and the HBM2 stack.
[0067] In an implementation, the example method 1200 can include embedding the organic interposer to underpass a first electronic component in order to couple with a second, more remote, electronic component. Thus, in an implementation, an example method may include mounting a first HBM2 stack and a second HBM2 stack on the core layer, connecting the first HBM2 stack to the ASIC via a first instance of the organic interposer, and underpassing the first HBM2 stack with a second instance of the organic interposer to connect the second HBM2 stack to the ASIC via the second instance of the organic interposer.
[0068] In the foregoing description and in the accompanying drawings, specific terminology and drawing symbols have been set forth to provide a thorough understanding of the disclosed embodiments. In some instances, the terminology and symbols may imply specific details that are not required to practice those embodiments. For example, any of the specific dimensions, quantities, material types, fabrication steps and the like can be different from those described above in alternative embodiments. The term coupled is used herein to express a direct connection as well as a connection through one or more intervening circuits or structures. The terms example, embodiment, and implementation are used to express an example, not a preference or requirement. Also, the terms may and can are used interchangeably to denote optional (permissible) subject matter. The absence of either term should not be construed as meaning that a given feature or technique is required.
[0069] Various modifications and changes can be made to the embodiments presented herein without departing from the broader spirit and scope of the disclosure. For example, features or aspects of any of the embodiments can be applied in combination with any other of the embodiments or in place of counterpart features or aspects thereof. Accordingly, the specification and drawings are to be regarded in an illustrative rather than a restrictive sense.
[0070] While the present disclosure has been disclosed with respect to a limited number of embodiments, those skilled in the art, having the benefit of this disclosure, will appreciate numerous modifications and variations possible given the description. It is intended that the appended claims cover such modifications and variations as fall within the true spirit and scope of the disclosure.