An electrode is disposed on a semiconductor layer. A polyimide layer has an opening disposed on the electrode, covers the edge of the electrode, and extends onto the electrode. A copper layer is disposed on the electrode within the opening, and located away from the polyimide layer on the electrode. A copper wire has one end joined on the copper layer.

This application provides a chip package structure. The chip package structure includes: a substrate and a chip, and further includes: a heat dissipation ring fastened onto the substrate and a planar heat pipe radiator covering the heat dissipation ring. The substrate, the heat dissipation ring, and the planar heat pipe radiator form a space to enclose the chip. A first metal thin film is disposed on a surface, facing the chip, of the planar heat pipe radiator, and the chip is thermally coupled to the first metal thin film by using a sintered metal layer.

A method of fabricating a semiconductor package may include forming a lower re-distribution layer, forming a stack, bonding the stack to a portion of the lower re-distribution layer, stacking a semiconductor chip on a top surface of the lower re-distribution layer, and forming an upper re-distribution layer on the semiconductor chip and the stack.

An electronics assembly comprises a semiconductor device having a first device surface and at least one device conductive layer disposed on the first device surface. A cooling structure is coupled to the semiconductor device. The cooling structure comprises a first cooling structure surface and a second cooling structure surface. The second cooling structure surface is opposite from the first cooling structure surface and the first cooling structure surface is coupled to the semiconductor device. One side cooling structure surface is transverse to the respective first and second cooling structure surface. The one side electrode is disposed on the at least one side cooling structure surface in which the at least one side electrode is electrically coupled to the at least one device conductive layer. The cooling structure includes a fluid inlet for receiving a cooling fluid and a fluid outlet for removing the cooling fluid from the cooling structure.

This disclosure is related to arranging micro devices in the donor substrate by either patterning or population so that there is no interfering with unwanted pads and the non-interfering area in the donor substrate is maximized. This enables to transfer the devices to receiver substrate with fewer steps.

A die transfer method and a die transfer system thereof are disclosed. The die transfer method includes the following steps: providing a wafer to generate a plurality of dies; transferring a plurality of dies to a surface of a donor substrate to fix the plurality of dies on the surface of the donor substrate by a photoreactive adhesive layer; aligning the donor substrate with a target substrate, wherein the target substrate has a landing site and the position of at least one die corresponds to the position of the landing site; irradiating the donor substrate with a radiation beam to cause the photoreactive adhesive layer to drop the at least one die, such that the at least one die is transferred onto the landing site of the target substrate; and fixing the at least one die at the landing site.

A die transfer method and a die transfer system thereof are disclosed. The die transfer method includes the following steps: providing a wafer to generate a plurality of dies; transferring a plurality of dies to a surface of a substrate to fix the plurality of dies on the surface of the substrate; aligning the substrate with a target substrate, wherein the target substrate has a landing site and the position of at least one die corresponds to the position of the landing site; in an air environment or a liquid environment, executing lyophilic or lyophobic treatment as compared to the periphery respectively to a bonding surface between the at least one die and the landing site of the target substrate; transferring the at least one die onto the landing site of the target substrate; and fixing the at least one die at the landing site.

This disclosure is related to arranging micro devices in the donor substrate by either patterning or population so that there is no interfering with unwanted pads and the non-interfering area in the donor substrate is maximized. This enables to have transfer the devices to receiver substrate with fewer steps.

A method of applying a die attach material includes forming a wafer stencil by selectively removing on the back side of a wafer including a plurality of semiconductor die having an active top side a predetermined depth to form a recess having an inner circumference while not removing an outer most circumference of the wafer. The recess is filled with a B-stage adhesive material. The wafer is singulated to form a plurality singulated semiconductor die. The singulated semiconductor die is die attached back side down to a package substrate, and then the B-stage adhesive material is cured. The B-stage adhesive material across its full area generally has a minimum thickness of at least 20 m and a maximum thickness range of 6 m.

A method of manufacturing a 3DIC structure includes the following processes. A die is bonded to a wafer. A first dielectric layer is formed on the wafer and laterally aside the die. A second dielectric material layer is formed on the die and the first dielectric layer. A portion of the second dielectric material layer over a non-edge region of the wafer is selectively removed to form a protruding portion over an edge region of the wafer. The second dielectric material layer is planarized to form a second dielectric layer on the first dielectric layer and the die. A bonding film is formed on the second dielectric layer. A carrier is bonded to the wafer through the bonding film.