In one aspect, there is provided a system including at least one processor; and at least one memory including program code which when executed by the at least one processor causes operations including capturing an image of at least a portion of a surface of an object; generating, from the captured image, pixel intensity data; in response to generating the pixel intensity data, determining, based on a height error model, height error data, wherein the height error data indicates an uncertainty of at least one height measurement of the object; and determining, based on the height error data, whether the object satisfies a threshold criteria for acceptance of the object. Related system, methods, and articles of manufacture are also disclosed.

In alternative embodiments, provided are moiré profilometry methods for analyzing a topography of an object comprising use of dual patterns that are simultaneously projected onto a surface of the object from two symmetric directions. In alternative embodiments, the projected dual patterns superimpose and generate a fringe pattern that contains a moiré pattern, the moiré pattern having a phase that is modulated according to the topography of the object. In alternative embodiments, the moiré pattern is extracted from the fringe pattern using a spatial or temporal method, and the phase is demodulated from the extracted moiré pattern using a spatial or temporal method.

An optical component for an attenuated total reflection multispectral imaging device, which includes a support substrate and at least two planar waveguides, and wherein the planar waveguides and the support substrate are superimposed together, with the support substrate which covers the planar waveguides; each of the planar waveguides includes at least one diffraction grating; and at least two of the planar waveguides have their diffraction gratings which have values of the average pattern distribution pitch which are distinct from each other; the support substrate includes, on one side opposite the planar waveguides, a face forming an exchange interface with a sample; and an exit face of the optical component corresponds to a lateral face of the support substrate.

A system for measuring (200) a sample (2) by deflectometry comprising: a source (10) for generating a light beam in a source plane (105); an illumination module (19) for forming an illumination beam (9) comprising: a first converging optical element (18); a first selection optical element (16) with a first aperture (160); reflective matrix optical modulation means (30) to form a pattern (7), said first aperture (160) being configured to control the angles of said illumination beam (9) on said reflective matrix optical modulation means (30); a Schlieren lens (20) for obtaining an angle-intensity encoding of said pattern (7) on the sample (2); imaging (40) and detecting means (50) for detecting an image of said sample (2).

In a conventional moir method, achieving both measurement accuracy and dynamic measurement and balancing field of view and measurement accuracy have been difficult. The present invention makes it possible to handle conventional moir fringes as a grating for generating phase-shifted second-order moir fringes, use a spatial phase shift method algorithm to accurately analyze the phases of the second-order moir fringes before and after deformation, and determine shape from the phase differences between gratings projected onto the surface of an object of measurement and a reference surface and determine deformation and strain from the phase differences between the second-order moir fringes, before and after deformation, of a repeating pattern on the object surface or a produced grating. As a result, it is possible to measure the three-dimensional shape and deformation distribution of an object accurately and with a wide field of view or dynamically and with a high degree of accuracy.

In a conventional moir method, achieving both measurement accuracy and dynamic measurement and balancing field of view and measurement accuracy have been difficult. The present invention makes it possible to handle conventional moir fringes as a grating for generating phase-shifted second-order moir fringes, use a spatial phase shift method algorithm to accurately analyze the phases of the second-order moir fringes before and after deformation, and determine shape from the phase differences between gratings projected onto the surface of an object of measurement and a reference surface and determine deformation and strain from the phase differences between the second-order moir fringes, before and after deformation, of a repeating pattern on the object surface or a produced grating. As a result, it is possible to measure the three-dimensional shape and deformation distribution of an object accurately and with a wide field of view or dynamically and with a high degree of accuracy.

A system for measuring (200) a sample (2) by deflectometry comprising: a source (10) for generating a light beam in a source plane (105); an illumination module (19) for forming an illumination beam (9) comprising: a first converging optical element (18); a first selection optical element (16) with a first aperture (160); reflective matrix optical modulation means (30) to form a pattern (7), said first aperture (160) being configured to control the angles of said illumination beam (9) on said reflective matrix optical modulation means (30); a Schlieren lens (20) for obtaining an angle-intensity encoding of said pattern (7) on the sample (2); imaging (40) and detecting means (50) for detecting an image of said sample (2).

An optical component for an attenuated total reflection multispectral imaging device, which includes a support substrate and at least two planar waveguides, and wherein the planar waveguides and the support substrate are superimposed together, with the support substrate which covers the planar waveguides; each of the planar waveguides includes at least one diffraction grating; and at least two of the planar waveguides have their diffraction gratings which have values of the average pattern distribution pitch which are distinct from each other; the support substrate includes, on one side opposite the planar waveguides, a face forming an exchange interface with a sample; and an exit face of the optical component corresponds to a lateral face of the support substrate.

PROBLEM TO BE SOLVED

Under conventional methods, calculation for determining the extent of damage progression inside a structural body by computation is difficult to apply in actual practice, and also time consuming. In addition, detection of damage occurring in objects with complicated shapes or infinitesimal damage is particularly difficult.

SOLUTION

When pressure applied from one surface of an object to be measured to another surface thereof is pressurized or depressurized, the distance d1 between two distorted sections R1, R2 due to damage formed on the other surface S, is detected and the extent of the said damage progression is measured.

In one aspect, there is provided a system including at least one processor, and at least one memory including program code which when executed by the at least one processor causes operations including capturing an image of at least a portion of a surface of an object; generating, from the captured image, pixel intensity data; in response to generating the pixel intensity data, determining, based on a height error model, height error data, wherein the height error data indicates an uncertainty of at least one height measurement of the object; and determining, based on the height error data, whether the object satisfies a threshold criteria for acceptance of the object. Related system, methods, and articles of manufacture are also disclosed.